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US 8,383,325 B2Granted
Lithographic apparatus and method
AssigneeASML Netherlands B.V.
InventorsNikolay Nikolaevich Iosad, Cheng-Qun Gui
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Abstract
A lithographic method includes providing particles in dry form on a substrate, or on material provided on the substrate, irradiating one or more of the particles with a dose of radiation, the dose of radiation being sufficient to ensure that at least one particle of the one or more particles is bonded to the substrate, or to the material provided on the substrate, and removing particles from the substrate, or from material provided on the substrate, that have not been bonded to the substrate, or to the material provided on the substrate.
Claims7
A lithographic method comprising:
- providing particles in dry form on a substrate;
- irradiating one or more of the particles with a dose of radiation, the dose of radiation being sufficient to ensure that at least one particle of the one or more particles is bonded to the substrate;
- applying an electric field or a magnetic field during irradiation to hold the one or more particles on the substrate;
- and
- removing particles from the substrate that have not been bonded to the substrate.
2 more elements
Dependencies are inferred from the claim text.