G03F 7/265
Selective reaction with inorganic or organometallic reagents after image-wise exposure
Official title: {Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation}
G03F7/265 (Selective reaction with inorganic or organometallic reagents after image-wise exposure) appears on 261 US grants and 163 published applications in this corpus.
Search patents in G03F- Granted patents
- 261
- Published applications
- 163
- Assignees
- 97
- Inventors
- 445
- Latest grant
- 14 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 4 | 0 |
| 1989 | 5 | 0 |
| 1990 | 5 | 0 |
| 1991 | 7 | 0 |
| 1992 | 8 | 0 |
| 1993 | 11 | 0 |
| 1994 | 9 | 0 |
| 1995 | 7 | 0 |
| 1996 | 7 | 0 |
| 1997 | 8 | 0 |
| 1998 | 23 | 0 |
| 1999 | 14 | 0 |
| 2000 | 8 | 0 |
| 2001 | 19 | 6 |
| 2002 | 18 | 11 |
| 2003 | 13 | 18 |
| 2004 | 11 | 11 |
| 2005 | 5 | 20 |
| 2006 | 5 | 7 |
| 2007 | 3 | 6 |
| 2008 | 3 | 4 |
| 2009 | 0 | 5 |
| 2010 | 2 | 5 |
| 2011 | 3 | 3 |
| 2012 | 7 | 8 |
| 2013 | 9 | 3 |
| 2014 | 3 | 6 |
| 2015 | 11 | 9 |
| 2016 | 5 | 2 |
| 2017 | 3 | 0 |
| 2018 | 1 | 0 |
| 2019 | 1 | 5 |
| 2020 | 1 | 6 |
| 2021 | 1 | 4 |
| 2022 | 4 | 6 |
| 2023 | 2 | 4 |
| 2024 | 5 | 4 |
| 2025 | 1 | 8 |
| 2026 | 1 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Bake strategies to enhance lithographic performance of metal-containing resist14 Apr 2026US 12,601,974 B2Lam Research Corporation
- Resist material and pattern forming method11 Mar 2025US 12,248,249 B2Oji Holdings Corporation
- Substrate processing apparatus and method17 Dec 2024US 12,169,361 B2ASM IP Holding B. V.
- Vapor phase thermal etch solutions for metal oxo photoresists20 Aug 2024US 12,068,170 B2APPLIED Materials.Inc.
- Vapor phase thermal etch solutions for metal oxo photoresists9 Jul 2024US 12,033,866 B2APPLIED Materials.Inc.
- Underlayer with entrapped extreme ultraviolet (euv) absorption element11 Jun 2026US 2026/0161090 A1APPLIED Materials.Inc.
- Semiconductor photoresist composition and method of forming patterns using the composition14 May 2026US 2026/0133487 A1Samsung SDI.Co., Ltd.
- Bake strategies to enhance lithographic performance of metal-containing resist31 Jul 2025US 2025/0244672 A1Lam Research Corporation
- Patterning method and patterning device31 Jul 2025US 2025/0244675 A1Tokyo Electron Limited
- Photolithographic method using silicon photoresist17 Jul 2025US 2025/0231491 A1Suntific Materials (Weifang), Ltd.
Most cited
By later US patents
- Large scale photolithographic solid phase synthesis of polypeptides and receptor binding screening thereof1,998US 5,143,854 AAffymax Technologies N.V. · 1992
- Array of oligonucleotides on a solid substrate1,585US 5,445,934 AAffymax Technologies N.V. · 1995
- Arrays of materials attached to a substrate1,410US 5,744,305 AAffymetrix, Inc. · 1998
- Very large scale immobilized polymer synthesis967US 5,424,186 AAffymax Technologies N.V. · 1995
- Method of detecting nucleic acids962US 5,800,992 A1998