Back to results
US 2026/0133487 A1Published application
Semiconductor photoresist composition and method of forming patterns using the composition
AssigneeSamsung SDI Co., Ltd.
InventorsSukil KANG, Minhye KIM
Life of this patent
Estimating the term…
Abstract
Disclosed are a semiconductor photoresist composition and a method of forming or providing patterns using the same, the semiconductor photoresist composition including an organometallic compound, a pyrrole-based compound including pyrrole, a pyrrole derivative, or a combination thereof; and a solvent.
Claims20
A semiconductor photoresist composition, comprising:
- an organometallic compound;
- a pyrrole-based compound comprising pyrrole, a pyrrole derivative, or a combination thereof;
- and
- a solvent.
1 more element
Dependencies are inferred from the claim text.