G03F 7/38
Treatment before imagewise removal
Official title: Treatment before imagewise removal, e.g. prebaking {(G03F7/265 takes precedence)}
G03F7/38 (Treatment before imagewise removal) appears on 1,478 US grants and 1,745 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,478
- Published applications
- 1,745
- Assignees
- 366
- Inventors
- 2,684
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 3 | 0 |
| 1982 | 0 | 0 |
| 1983 | 4 | 0 |
| 1984 | 4 | 0 |
| 1985 | 3 | 0 |
| 1986 | 5 | 0 |
| 1987 | 3 | 0 |
| 1988 | 1 | 0 |
| 1989 | 4 | 0 |
| 1990 | 8 | 0 |
| 1991 | 5 | 0 |
| 1992 | 6 | 0 |
| 1993 | 9 | 0 |
| 1994 | 12 | 0 |
| 1995 | 12 | 0 |
| 1996 | 12 | 0 |
| 1997 | 9 | 0 |
| 1998 | 27 | 0 |
| 1999 | 20 | 0 |
| 2000 | 26 | 0 |
| 2001 | 34 | 10 |
| 2002 | 31 | 34 |
| 2003 | 28 | 44 |
| 2004 | 27 | 31 |
| 2005 | 25 | 43 |
| 2006 | 19 | 27 |
| 2007 | 10 | 35 |
| 2008 | 18 | 44 |
| 2009 | 12 | 28 |
| 2010 | 18 | 30 |
| 2011 | 17 | 32 |
| 2012 | 18 | 39 |
| 2013 | 29 | 42 |
| 2014 | 40 | 59 |
| 2015 | 65 | 62 |
| 2016 | 74 | 109 |
| 2017 | 88 | 144 |
| 2018 | 97 | 132 |
| 2019 | 96 | 148 |
| 2020 | 96 | 124 |
| 2021 | 88 | 89 |
| 2022 | 91 | 110 |
| 2023 | 90 | 105 |
| 2024 | 64 | 82 |
| 2025 | 67 | 78 |
| 2026 | 60 | 64 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Compound, (co)polymer, composition, method for forming pattern, and method for producing compound15 Sep 2026US 12,735,382 B2Mitsubishi Gas Chemical Company, Inc.
- Providing a barrier layer for photoresist processing15 Sep 2026US 12,736,881 B2Tokyo Electron Limited
- Substrate treatment method, substrate treatment apparatus, and computer storage medium8 Sep 2026US 12,733,422 B2Tokyo Electron Limited
- Method for forming a monodisperse granular film1 Sep 2026US 12,724,349 B2Jinko Solar Co., Ltd.
- Inspection method, method for producing composition, and method for verifying composition25 Aug 2026US 12,717,245 B2FUJIFILM Corporation
- Gas-based development of organometallic resist in an oxidizing halogen-donating environment8 Oct 2026US 2026/0310073 A1Inpria Corporation
- Magnetic annealing of metal oxide based resists8 Oct 2026US 2026/0310086 A1APPLIED Materials.Inc.
- Method for manufacturing semiconductor used resist with magnetic materials in line/space pattern1 Oct 2026US 2026/0299427 A1Nanya Technology Corporation
- Method and system of endpoint detection in etching process24 Sep 2026US 2026/0293614 A1Tokyo Electron Limited
- Photoresist composition and method of manufacturing a semiconductor device17 Sep 2026US 2026/0277102 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Large scale photolithographic solid phase synthesis of polypeptides and receptor binding screening thereof1,998US 5,143,854 AAffymax Technologies N.V. · 1992
- Array of oligonucleotides on a solid substrate1,585US 5,445,934 AAffymax Technologies N.V. · 1995
- Arrays of materials attached to a substrate1,410US 5,744,305 AAffymetrix, Inc. · 1998
- Very large scale immobilized polymer synthesis967US 5,424,186 AAffymax Technologies N.V. · 1995
- Method of detecting nucleic acids962US 5,800,992 A1998