G03F 7/34
Imagewise removal by selective transfer
Official title: Imagewise removal by selective transfer, e.g. peeling away
G03F7/34 (Imagewise removal by selective transfer) appears on 297 US grants and 151 published applications in this corpus.
Search patents in G03F- Granted patents
- 297
- Published applications
- 151
- Assignees
- 117
- Inventors
- 597
- Latest grant
- 9 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 7 | 0 |
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 4 | 0 |
| 1980 | 5 | 0 |
| 1981 | 12 | 0 |
| 1982 | 9 | 0 |
| 1983 | 2 | 0 |
| 1984 | 4 | 0 |
| 1985 | 3 | 0 |
| 1986 | 2 | 0 |
| 1987 | 4 | 0 |
| 1988 | 4 | 0 |
| 1989 | 1 | 0 |
| 1990 | 4 | 0 |
| 1991 | 10 | 0 |
| 1992 | 3 | 0 |
| 1993 | 11 | 0 |
| 1994 | 13 | 0 |
| 1995 | 14 | 0 |
| 1996 | 15 | 0 |
| 1997 | 13 | 0 |
| 1998 | 14 | 0 |
| 1999 | 18 | 0 |
| 2000 | 10 | 0 |
| 2001 | 5 | 2 |
| 2002 | 5 | 6 |
| 2003 | 1 | 4 |
| 2004 | 3 | 2 |
| 2005 | 5 | 7 |
| 2006 | 6 | 8 |
| 2007 | 3 | 2 |
| 2008 | 1 | 1 |
| 2009 | 1 | 4 |
| 2010 | 2 | 5 |
| 2011 | 1 | 2 |
| 2012 | 1 | 5 |
| 2013 | 5 | 6 |
| 2014 | 3 | 6 |
| 2015 | 12 | 5 |
| 2016 | 3 | 10 |
| 2017 | 3 | 6 |
| 2018 | 8 | 8 |
| 2019 | 6 | 7 |
| 2020 | 6 | 8 |
| 2021 | 5 | 7 |
| 2022 | 3 | 8 |
| 2023 | 7 | 15 |
| 2024 | 5 | 8 |
| 2025 | 8 | 8 |
| 2026 | 4 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Thermal development apparatus of flexographic plates9 Jun 2026US 12,649,330 B2Vianord Engineering Sasu
- Method to reduce line edge roughness for EUV photoresist pattern9 Jun 2026US 12,650,648 B2APPLIED Materials.Inc.
- Block copolymer for lithography and lithography method using the same26 May 2026US 12,638,770 B2Industry-Academic Cooperation Foundation, Yonsei University
- Nanoimprint composition and pattern forming method13 Jan 2026US 12,523,930 B2Tokyo Ohka Kogyo.Co., Ltd.
- Thermal development apparatus of flexographic plates25 Nov 2025US 12,481,217 B1Vianord Engineering Sasu
- Composition for forming resist underlayer film, patterning process, and resist underlayer film formation process8 Jan 2026US 2026/0008932 A1Shin-Etsu Chemical Co., Ltd.
- Benzenesulfonic acid salt compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process18 Dec 2025US 2025/0383600 A1Shin-Etsu Chemical Co., Ltd.
- Resist composition, laminate, and pattern forming process18 Sep 2025US 2025/0291249 A1Shin-Etsu Chemical Co., Ltd.
- Photosensitive resin composition, photosensitive element, printed wiring board, and method for producing printed wiring board28 Aug 2025US 2025/0271758 A1
- Composition for Forming Organic Film, Method for Forming Organic Film and Patterning Process28 Aug 2025US 2025/0271763 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Decal transfer lithography220US 7,662,545 B2The Board of Trustees of the University of Illinois · 2010
- Imaged article on polymeric substrate136US 6,203,952 B13M Innovative Properties Company · 2001
- Method of forming a monolayer of particles, and products formed thereby76US 6,180,226 B2Loctite (R&D) Limited · 2001
- Pre-imaged high resolution hot stamp transfer foil, article and method60US 5,002,312 AFlex Products, Inc. · 1991
- Method for patterning thin films57US 6,399,258 B23M Innovative Properties Company · 2002