G03F 7/346
Using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
Official title: {using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds}
G03F7/346 (Using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds) appears on 66 US grants and 14 published applications in this corpus.
Search patents in G03F- Granted patents
- 66
- Published applications
- 14
- Assignees
- 34
- Inventors
- 148
- Latest grant
- 9 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 5 | 0 |
| 1982 | 2 | 0 |
| 1983 | 2 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 7 | 0 |
| 1994 | 2 | 0 |
| 1995 | 7 | 0 |
| 1996 | 3 | 0 |
| 1997 | 3 | 0 |
| 1998 | 4 | 0 |
| 1999 | 4 | 0 |
| 2000 | 3 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 3 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 4 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 1 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 1 |
| 2021 | 0 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 3 |
| 2024 | 0 | 2 |
| 2025 | 1 | 1 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method to reduce line edge roughness for EUV photoresist pattern9 Jun 2026US 12,650,648 B2APPLIED Materials.Inc.
- Block copolymer for lithography and lithography method using the same26 May 2026US 12,638,770 B2Industry-Academic Cooperation Foundation, Yonsei University
- Material for forming organic film, patterning process, compound, and polymer5 Aug 2025US 12,379,662 B2Shin-Etsu Chemical Co., Ltd.
- Methods and apparatus for the manufacture of microstructures28 Feb 2012US 8,124,325 B23T Technologies Limited
- Decal transfer lithography16 Feb 2010US 7,662,545 B2The Board of Trustees of the University of Illinois
- Composition for Forming Organic Film, Method for Forming Organic Film and Patterning Process28 Aug 2025US 2025/0271763 A1Shin-Etsu Chemical Co., Ltd.
- Euv-induced condensation of polysiloxane sol-gel thin film25 Apr 2024US 2024/0134281 A1Brewer Science Inc.
- Method to reduce line edge roughness for euv photoresist pattern25 Jan 2024US 2024/0027912 A1APPLIED Materials.Inc.
- Block copolymer for lithography and lithography method using the same16 Nov 2023US 2023/0367215 A1Industry-Academic Cooperation Foundation, Yonsei University
- Curable composition for imprinting, coating film, method for producing film, cured product, method for producing imprint pattern, and method for producing device6 Apr 2023US 2023/0109153 A1FUJIFILM Corporation
Most cited
By later US patents
- Decal transfer lithography220US 7,662,545 B2The Board of Trustees of the University of Illinois · 2010
- Pre-imaged high resolution hot stamp transfer foil, article and method60US 5,002,312 AFlex Products, Inc. · 1991
- Pre-imaged high resolution hot stamp transfer foil, article and method56US 5,186,787 A1993
- Processes and compositions for photogeneration of acid50US 5,401,607 APolaroid Corporation · 1995
- Dry transfer article48US 4,454,179 AMinnesota Mining and Manufacturing Company · 1984