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US 12,523,930 B2Granted
Nanoimprint composition and pattern forming method
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsKenri Konno, Risako Mori
Life of this patent
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Abstract
A nanoimprint composition including an unsaturated acid metal salt (R), a photopolymerizable compound (B), a photoradical polymerization initiator, and a solvent component having compatibility with the unsaturated acid metal salt (R) and the photopolymerizable compound (B), in which a content of the unsaturated acid metal salt (R) is 50 parts by mass or greater with respect to 100 parts by mass of a total content of the unsaturated acid metal salt (R) and the photopolymerizable compound (B).
Claims12
A pattern forming method comprising:
- forming a photocurable film on a substrate using a nanoimprint composition;
- pressing a mold having an uneven pattern against the photocurable film to transfer the uneven pattern to the photocurable film;
- exposing the photocurable film to which the uneven pattern has been transferred while pressing the mold against the photocurable film to form a cured film;
- and
- peeling the mold off the cured film,
- the nanoimprint composition comprising:
- a component (R) which is an unsaturated acid metal salt selected from the group consisting of zinc (meth)acrylate, calcium (meth)acrylate, magnesium (meth)acrylate, and aluminum (meth)acrylate;
- a component (B) which is a photopolymerizable compound, provided that a compound corresponding to the component (R) is excluded from the component (B);
- a component (C) which is a photoradical polymerization initiator;
- and
- a component (S1) which is a solvent component having compatibility with the component (R) and the component (B),
- wherein a content of the component (R) is 50 parts by mass or greater with respect to 100 parts by mass of a total content of the component (R) and the component (B),
- a content of the component (B) is 20 to 50 parts by mass with respect to 100 parts by mass of the total content of the component (R) and the component (B),
- the component (S1) contains at least one solvent (S11a) selected from the group consisting of methanol, ethanol, and propylene glycol, and
- a content of the solvent (S11a) is 20% by mass or greater with respect to 100% by mass of a total content of the component (S1).
12 more elements
A pattern forming method comprising:
- forming a photocurable film on a substrate using a nanoimprint composition;
- pressing a mold having an uneven pattern against the photocurable film to transfer the uneven pattern to the photocurable film;
- exposing the photocurable film to which the uneven pattern has been transferred while pressing the mold against the photocurable film to form a cured film;
- and
- peeling the mold off the cured film, wherein the nanoimprint composition comprises:
- a component (R) which is an unsaturated acid metal salt selected from the group consisting of zinc (meth)acrylate, calcium (meth)acrylate, magnesium (meth)acrylate, and aluminum (meth)acrylate;
- a component (B) which is a photopolymerizable compound, provided that a compound corresponding to the component (R) is excluded from the component (B);
- a component (C) which is a photoradical polymerization initiator;
- and
- a component (S1) which is a solvent component having compatibility with the component (R) and the component (B),
- wherein a content of the component (R) is 50 parts by mass or greater with respect to 100 parts by mass of a total content of the component (R) and the component (B),
- the component (S1) contains at least one solvent (S11a) selected from the group consisting of methanol, ethanol, and propylene glycol,
- a content of the solvent (S11a) is 20% by mass or greater with respect to 100% by mass of a total content of the component (S1), and
- the nanoimprint composition does not comprise 1-hydroxycyclohexylphenyl ketone.
11 more elements
A pattern forming method comprising:
- forming a photocurable film on a substrate using a nanoimprint composition;
- pressing a mold having an uneven pattern against the photocurable film to transfer the uneven pattern to the photocurable film;
- exposing the photocurable film to which the uneven pattern has been transferred while pressing the mold against the photocurable film to form a cured film;
- and
- peeling the mold off the cured film, wherein the nanoimprint composition comprises:
- a component (R) which is an unsaturated acid metal salt selected from the group consisting of zinc (meth)acrylate, calcium (meth)acrylate, magnesium (meth)acrylate, and aluminum (meth)acrylate;
- a component (B) which is a photopolymerizable compound, provided that a compound corresponding to the component (R) is excluded from the component (B);
- a component (C) which is a photoradical polymerization initiator;
- and
- a component (S1) which is a solvent component having compatibility with the component (R) and the component (B),
- wherein a content of the component (R) is 50 parts by mass or greater with respect to 100 parts by mass of a total content of the component (R) and the component (B),
- the component (S1) contains at least one solvent (S11a) selected from the group consisting of methanol, ethanol, and propylene glycol,
- a content of the solvent (S11a) is 20% by mass or greater with respect to 100% by mass of a total content of the component (S1), and
- the nanoimprint composition does not comprise dipentaerythritol pentaacrylate.
11 more elements
Dependencies are inferred from the claim text.