G03F 7/30
Imagewise removal using liquid means
G03F7/30 (Imagewise removal using liquid means) appears on 3,758 US grants and 4,296 published applications in this corpus.
Search patents in G03F- Granted patents
- 3,758
- Published applications
- 4,296
- Assignees
- 773
- Inventors
- 6,000
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 20 | 0 |
| 1977 | 11 | 0 |
| 1978 | 15 | 0 |
| 1979 | 15 | 0 |
| 1980 | 19 | 0 |
| 1981 | 14 | 0 |
| 1982 | 16 | 0 |
| 1983 | 21 | 0 |
| 1984 | 21 | 0 |
| 1985 | 21 | 0 |
| 1986 | 19 | 0 |
| 1987 | 18 | 0 |
| 1988 | 24 | 0 |
| 1989 | 35 | 0 |
| 1990 | 24 | 0 |
| 1991 | 24 | 0 |
| 1992 | 24 | 0 |
| 1993 | 39 | 0 |
| 1994 | 31 | 0 |
| 1995 | 29 | 0 |
| 1996 | 20 | 0 |
| 1997 | 22 | 0 |
| 1998 | 51 | 0 |
| 1999 | 46 | 0 |
| 2000 | 55 | 0 |
| 2001 | 68 | 30 |
| 2002 | 59 | 55 |
| 2003 | 63 | 77 |
| 2004 | 58 | 64 |
| 2005 | 39 | 77 |
| 2006 | 35 | 68 |
| 2007 | 30 | 65 |
| 2008 | 42 | 88 |
| 2009 | 34 | 78 |
| 2010 | 39 | 96 |
| 2011 | 48 | 109 |
| 2012 | 70 | 126 |
| 2013 | 81 | 145 |
| 2014 | 140 | 200 |
| 2015 | 182 | 276 |
| 2016 | 247 | 384 |
| 2017 | 242 | 346 |
| 2018 | 252 | 316 |
| 2019 | 277 | 297 |
| 2020 | 227 | 277 |
| 2021 | 172 | 214 |
| 2022 | 174 | 245 |
| 2023 | 174 | 178 |
| 2024 | 147 | 171 |
| 2025 | 150 | 170 |
| 2026 | 74 | 144 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/32Liquid compositions therefor2,349
- G03F 7/3021From a wafer supported on a rotating chuck496
- G03F 7/3042From printing plates transported horizontally through the processing stations255
- G03F 7/3092Recovery of material100
- G03F 7/3035From printing plates fixed on a cylinder or on a curved surface74
- G03F 7/3085From plates or webs transported vertically26
- G03F 7/3014Combined with ultrasonic means23
- G03F 7/3007Combined with electrical means9
Recent patents
- Apparatus for treating substrate and method for treating a substrate6 Oct 2026US 12,754,475 B2Semes Co., Ltd.
- Compound, (co)polymer, composition, method for forming pattern, and method for producing compound15 Sep 2026US 12,735,382 B2Mitsubishi Gas Chemical Company, Inc.
- Resist composition and method for forming resist pattern15 Sep 2026US 12,736,875 B2Tokyo Ohka Kogyo.Co., Ltd.
- Compound, binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same15 Sep 2026US 12,736,876 B2LG Chem.Ltd.
- Polymer crosslink de-crosslink processes for resist patterning15 Sep 2026US 12,736,882 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method for Multicolor Lithography Using Mechanical Force8 Oct 2026US 2026/0308288 A1California Institute of Technology
- Method and apparatus for fabrication of large area 3d photonic crystals with embedded waveguides8 Oct 2026US 2026/0310072 A1UNM Rainforest Innovations
- Photoactive compounds1 Oct 2026US 2026/0299409 A1Merck Patent GmbH
- Resist composition and resist pattern formation method1 Oct 2026US 2026/0299410 A1Tokyo Ohka Kogyo.Co., Ltd.
- Photosensitive resin composition, resin film having pattern, method for producing resin film having pattern, and semiconductor circuit board24 Sep 2026US 2026/0292972 A1Jsr Corporation
Most cited
By later US patents
- Substrate processing system, coating/developing apparatus, and substrate processing apparatus485US 7,379,785 B2Tokyo Electron Limited · 2008
- Organometallic solution based high resolution patterning compositions475US 9,310,684 B2Inpria Corporation · 2016
- Cleaning solution for photoresist and method for forming pattern using the same470US 7,238,653 B2Hynix Semiconductor Inc. · 2007
- Coater/developer, coating/developing method, and storage medium469US 7,591,601 B2Tokyo Electron Limited · 2009
- Pattern forming method and pattern forming apparatus using exposures in a liquid466US 4,396,705 AHitachi, Ltd. · 1983