G03F 7/32
Liquid compositions therefor
Official title: Liquid compositions therefor, e.g. developers
G03F7/32 (Liquid compositions therefor) appears on 2,349 US grants and 3,046 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,349
- Published applications
- 3,046
- Assignees
- 512
- Inventors
- 3,989
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 4 | 0 |
| 1978 | 3 | 0 |
| 1979 | 3 | 0 |
| 1980 | 4 | 0 |
| 1981 | 9 | 0 |
| 1982 | 7 | 0 |
| 1983 | 11 | 0 |
| 1984 | 9 | 0 |
| 1985 | 7 | 0 |
| 1986 | 10 | 0 |
| 1987 | 12 | 0 |
| 1988 | 8 | 0 |
| 1989 | 21 | 0 |
| 1990 | 8 | 0 |
| 1991 | 11 | 0 |
| 1992 | 15 | 0 |
| 1993 | 18 | 0 |
| 1994 | 13 | 0 |
| 1995 | 9 | 0 |
| 1996 | 8 | 0 |
| 1997 | 8 | 0 |
| 1998 | 18 | 0 |
| 1999 | 20 | 0 |
| 2000 | 24 | 0 |
| 2001 | 27 | 17 |
| 2002 | 29 | 27 |
| 2003 | 29 | 48 |
| 2004 | 27 | 36 |
| 2005 | 19 | 42 |
| 2006 | 17 | 31 |
| 2007 | 13 | 38 |
| 2008 | 19 | 44 |
| 2009 | 12 | 40 |
| 2010 | 18 | 48 |
| 2011 | 19 | 64 |
| 2012 | 41 | 81 |
| 2013 | 35 | 93 |
| 2014 | 91 | 141 |
| 2015 | 121 | 170 |
| 2016 | 166 | 340 |
| 2017 | 196 | 284 |
| 2018 | 211 | 223 |
| 2019 | 196 | 239 |
| 2020 | 159 | 189 |
| 2021 | 127 | 152 |
| 2022 | 117 | 190 |
| 2023 | 127 | 131 |
| 2024 | 110 | 121 |
| 2025 | 109 | 130 |
| 2026 | 48 | 127 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Compound, (co)polymer, composition, method for forming pattern, and method for producing compound15 Sep 2026US 12,735,382 B2Mitsubishi Gas Chemical Company, Inc.
- Resist composition and method for forming resist pattern15 Sep 2026US 12,736,875 B2Tokyo Ohka Kogyo.Co., Ltd.
- Compound, binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same15 Sep 2026US 12,736,876 B2LG Chem.Ltd.
- Methods and materials for metallic photoresist25 Aug 2026US 12,717,229 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Alkaline developer soluable silicon-containing resist underlayer film-forming composition25 Aug 2026US 12,717,235 B2Nissan Chemical Corporation
- Method for Multicolor Lithography Using Mechanical Force8 Oct 2026US 2026/0308288 A1California Institute of Technology
- Method and apparatus for fabrication of large area 3d photonic crystals with embedded waveguides8 Oct 2026US 2026/0310072 A1UNM Rainforest Innovations
- Photoactive compounds1 Oct 2026US 2026/0299409 A1Merck Patent GmbH
- Resist composition and resist pattern formation method1 Oct 2026US 2026/0299410 A1Tokyo Ohka Kogyo.Co., Ltd.
- Photosensitive resin composition, resin film having pattern, method for producing resin film having pattern, and semiconductor circuit board24 Sep 2026US 2026/0292972 A1Jsr Corporation
Most cited
By later US patents
- Organometallic solution based high resolution patterning compositions475US 9,310,684 B2Inpria Corporation · 2016
- Cleaning solution for photoresist and method for forming pattern using the same470US 7,238,653 B2Hynix Semiconductor Inc. · 2007
- EUV photopatterning of vapor-deposited metal oxide-containing hardmasks405US 9,996,004 B2Lam Research Corporation · 2018
- Method and photoresist with zipper mechanism130US 8,323,870 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2012
- Organotin oxide hydroxide patterning compositions, precursors, and patterning84US 10,228,618 B2Inpria Corporation · 2019