Photoactive compounds

Abstract

A covalent compound free of any fluoroalkyls, any perfluoroalkyls or mixtures of fluoroalkyls and perfluoroalkyls comprising an imide N-(carbonylcarbamido) aryl sulfate moiety. In one of this compound it has structure (I), wherein R1 is a linking group selected from the group consisting of an unsubstituted alkylene, a substituted alkylene, an unsubstituted vinylene, a substituted vinylene, an unsubstituted arylene, and a substituted arylene, where these linking groups are free of any fluoroalkyls, any perfluoroalkyls or mixtures of fluoroalkyls and perfluoroalkyls, and R2 is an unsubstituted aryl or a substituted aryl which are free of any fluoroalkyls, any perfluoroalkyls or mixtures of fluoroalkyls and perfluoroalkyls and np is 1, 2, 3, 4 or 5. A positive or negative chemically amplified photoresist composition comprising as a PAG component said covalent compound. A process of forming a positive or negative photoresist patter respectively using said positive or negative chemically amplified photoresists.

Dependencies are inferred from the claim text.