Organometallic solution based high resolution patterning compositions
AssigneeInpria Corporation
InventorsStephen T. Meyers, Douglas A. Keszler, Kai Jiang, Jeremy Anderson, Andrew Grenville
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AssigneeInpria Corporation
InventorsStephen T. Meyers, Douglas A. Keszler, Kai Jiang, Jeremy Anderson, Andrew Grenville
Estimating the term…
Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.
A method for patterning a substrate with radiation, the method comprising:
A coated substrate comprising a radiation sensitive coating having an average thickness from about 5 nm to about 200 nm and a thickness variation of no more than about 50% from the average at any point along the coating, the coating comprising a metal oxo-hydroxo network with metal cations having organic ligands with metal carbon bonds and/or with metal carboxylate bonds, wherein the oxo-hydroxo network has both M-O—H linkages and M-O-M linkages.
A patterned substrate comprising a substrate with a surface and a first coating at selected regions along the surface and absent at other regions along the surface, the first coating comprising a metal oxo-hydroxo network and organic ligands with metal cations having organic ligands with metal carbon bonds and/or with metal carboxylate bonds, wherein the oxo-hydroxo network has both M-O—H linkages and M-O-M linkages, wherein alternatively the first coating is soluble in at least some organic liquids or the first coating is soluble in aqueous bases.
A precursor solution comprising an organic liquid and from about 0.01M to about 1.4M metal polynuclear oxo/hydroxo cation with organic ligands having metal carbon bonds and/or with metal carboxylate bonds, wherein the metal polynuclear oxo/hydroxo cation with organic ligands forms an oxo-hydroxo network, wherein the oxo-hydroxo network has both M-O—H linkages and M-O-M linkages, the precursor solution having a viscosity from about 0.5 centipoises (cP) to about 150 cP and the organic liquid having a flash point of at least 10° C. and a vapor pressure at 20° C. less than about 10 kPa.
Dependencies are inferred from the claim text.