G03F 7/325
Non-aqueous compositions
Official title: {Non-aqueous compositions}
G03F7/325 (Non-aqueous compositions) appears on 971 US grants and 1,408 published applications in this corpus.
Search patents in G03F- Granted patents
- 971
- Published applications
- 1,408
- Assignees
- 226
- Inventors
- 1,710
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 3 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 4 | 0 |
| 1986 | 3 | 0 |
| 1987 | 3 | 0 |
| 1988 | 1 | 0 |
| 1989 | 5 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 5 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 4 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 4 | 0 |
| 2001 | 4 | 3 |
| 2002 | 2 | 2 |
| 2003 | 5 | 3 |
| 2004 | 3 | 6 |
| 2005 | 3 | 6 |
| 2006 | 0 | 7 |
| 2007 | 3 | 5 |
| 2008 | 3 | 7 |
| 2009 | 0 | 3 |
| 2010 | 3 | 16 |
| 2011 | 7 | 25 |
| 2012 | 12 | 58 |
| 2013 | 17 | 64 |
| 2014 | 60 | 90 |
| 2015 | 79 | 95 |
| 2016 | 88 | 147 |
| 2017 | 87 | 124 |
| 2018 | 97 | 90 |
| 2019 | 64 | 92 |
| 2020 | 65 | 86 |
| 2021 | 50 | 83 |
| 2022 | 57 | 92 |
| 2023 | 65 | 76 |
| 2024 | 60 | 71 |
| 2025 | 65 | 82 |
| 2026 | 23 | 75 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Methods and materials for metallic photoresist25 Aug 2026US 12,717,229 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Apparatus and method for processing substrate28 Jul 2026US 12,693,598 B2Semes Co., Ltd.
- Method for multicolor lithography using mechanical force14 Jul 2026US 12,679,909 B2California Institute of Technology
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device16 Jun 2026US 12,656,684 B2FUJIFILM Corporation
- Liquid chemical and method for producing liquid chemical9 Jun 2026US 12,650,647 B2FUJIFILM Corporation
- Method for Multicolor Lithography Using Mechanical Force8 Oct 2026US 2026/0308288 A1California Institute of Technology
- Photosensitive resin composition, resin film having pattern, method for producing resin film having pattern, and semiconductor circuit board24 Sep 2026US 2026/0292972 A1Jsr Corporation
- Process and system for minimizing plate deformation in the solvent-minimized manufacture of a printing plate13 Aug 2026US 2026/0233508 A1Esko-Graphics Imaging GmbH
- Resist composition, resist pattern formation method, compound, and polymer compound13 Aug 2026US 2026/0235949 A1Tokyo Ohka Kogyo.Co., Ltd.
- Copolymer, positive resist composition, and method of forming resist pattern13 Aug 2026US 2026/0235952 A1Zeon Corporation
Most cited
By later US patents
- Organometallic solution based high resolution patterning compositions475US 9,310,684 B2Inpria Corporation · 2016
- Method and photoresist with zipper mechanism130US 8,323,870 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2012
- Organotin oxide hydroxide patterning compositions, precursors, and patterning84US 10,228,618 B2Inpria Corporation · 2019
- Photoresist develop and strip solvent compositions and method for their use80US 5,268,260 AInternational Business Machines Corporation · 1993
- Method of forming patterns78US 7,998,655 B2FUJIFILM Corporation · 2011