Photoresist develop and strip solvent compositions and method for their use

A method of patterning a free-radical initiated, addition polymerizable acrylate monomer photoresist, comprising the steps of:

• a. providing the acrylate monomer photoresist film on a substrate;
• b. selectively exposing at least one predetermined area of the acrylate photoresist film to actinic radiation for a time sufficient to effect a contrast in the extent of crosslinking in the exposed and unexposed areas of the photoresist film;
• c. developing the exposed acrylate photoresist film in a developing solvent consisting essentially of propylene carbonate and from about 0.1 to about 10 weight percent of an additive selected from the group consisting of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, formamide, nitromethane, propylene oxide, methyl ethyl ketone, and water;
• and
• d. thereafter rinsing the photoresist coated substrate with water at a temperature of about 17 degrees Centigrade to about 60 degrees Centigrade.

A method of patterning a free-radical initiated, addition polymerizable acrylate monomer photoresist, comprising the steps of:

• a. providing the acrylate monomer photoresist film on a substrate;
• b. selectively exposing at least one predetermined area of the acrylate photoresist film to actinic radiation for a time sufficient to effect a contrast in the extent of crosslinking in the exposed and unexposed areas of the photoresist film;
• c. developing the exposed acrylate photoresist film in a developing solvent consisting essentially of propylene carbonate and from about 0.1 to about 10 weight percent of an additive selected from the group consisting of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, formamide, nitromethane, propylene oxide, methyl ethyl ketone, and water at a temperature of about 15 degrees Centigrade to about 45 degrees Centigrade for about 0.5 to about 12 minutes;
• and
• d. thereafter rinsing the photoresist coated substrate with water at a temperature of about 17 degrees Centigrade to about 60 degrees Centigrade.