G03F 7/322
Aqueous alkaline compositions
Official title: {Aqueous alkaline compositions}
G03F7/322 (Aqueous alkaline compositions) appears on 1,102 US grants and 1,414 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,102
- Published applications
- 1,414
- Assignees
- 268
- Inventors
- 2,195
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 3 | 0 |
| 1982 | 2 | 0 |
| 1983 | 3 | 0 |
| 1984 | 5 | 0 |
| 1985 | 3 | 0 |
| 1986 | 6 | 0 |
| 1987 | 6 | 0 |
| 1988 | 5 | 0 |
| 1989 | 11 | 0 |
| 1990 | 2 | 0 |
| 1991 | 5 | 0 |
| 1992 | 11 | 0 |
| 1993 | 6 | 0 |
| 1994 | 7 | 0 |
| 1995 | 6 | 0 |
| 1996 | 4 | 0 |
| 1997 | 5 | 0 |
| 1998 | 11 | 0 |
| 1999 | 17 | 0 |
| 2000 | 13 | 0 |
| 2001 | 19 | 11 |
| 2002 | 21 | 17 |
| 2003 | 20 | 35 |
| 2004 | 18 | 27 |
| 2005 | 13 | 33 |
| 2006 | 16 | 19 |
| 2007 | 9 | 29 |
| 2008 | 13 | 25 |
| 2009 | 11 | 34 |
| 2010 | 10 | 36 |
| 2011 | 10 | 34 |
| 2012 | 26 | 22 |
| 2013 | 18 | 26 |
| 2014 | 29 | 42 |
| 2015 | 37 | 63 |
| 2016 | 57 | 93 |
| 2017 | 65 | 151 |
| 2018 | 84 | 119 |
| 2019 | 102 | 123 |
| 2020 | 78 | 97 |
| 2021 | 72 | 73 |
| 2022 | 66 | 103 |
| 2023 | 56 | 51 |
| 2024 | 52 | 43 |
| 2025 | 41 | 44 |
| 2026 | 24 | 64 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Compound, (co)polymer, composition, method for forming pattern, and method for producing compound15 Sep 2026US 12,735,382 B2Mitsubishi Gas Chemical Company, Inc.
- Resist composition and method for forming resist pattern15 Sep 2026US 12,736,875 B2Tokyo Ohka Kogyo.Co., Ltd.
- Compound, binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same15 Sep 2026US 12,736,876 B2LG Chem.Ltd.
- Methods and materials for metallic photoresist25 Aug 2026US 12,717,229 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Alkaline developer soluable silicon-containing resist underlayer film-forming composition25 Aug 2026US 12,717,235 B2Nissan Chemical Corporation
- Photoactive compounds1 Oct 2026US 2026/0299409 A1Merck Patent GmbH
- Resist composition and resist pattern formation method1 Oct 2026US 2026/0299410 A1Tokyo Ohka Kogyo.Co., Ltd.
- Chemically amplified positive resist composition and resist pattern forming process10 Sep 2026US 2026/0267226 A1Shin-Etsu Chemical Co., Ltd.
- Poly(phthalaldehyde) derivatives, compositions including the same, and pattern formation methods3 Sep 2026US 2026/0259496 A1Cornell University
- Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing circuit board27 Aug 2026US 2026/0251970 A1
Most cited
By later US patents
- Organometallic solution based high resolution patterning compositions475US 9,310,684 B2Inpria Corporation · 2016
- Cleaning solution for photoresist and method for forming pattern using the same470US 7,238,653 B2Hynix Semiconductor Inc. · 2007
- Method for developing poly(methacrylic anhydride) resists83US 4,777,119 AHughes Aircraft Company · 1988
- Method of forming a minute resist pattern79US 6,933,100 B2Clariant Finance (BVI) Limited · 2005
- Organometallic solution based high resolution patterning compositions and corresponding methods62US 10,642,153 B2Inpria Corporation · 2020