Poly(phthalaldehyde) derivatives, compositions including the same, and pattern formation methods

Abstract

A photoresist composition including a first polymer including a first repeating unit derived from a compound of Formula (1); a second polymer including a first repeating unit comprising an acid-labile group, a base-labile group, a base soluble group, or a combination thereof, wherein the first repeating unit of the second polymer is derived from a monomer comprising an ethylenically unsaturated polymerizable double bond; a photoacid generator; and a solvent, wherein, in Formula (1), each R1 is a non-hydrogen substituent, each R1 optionally further includes one or more divalent linking groups as part of their structure, wherein each of the one or more divalent linking groups is independently substituted or unsubstituted, two adjacent R1 optionally form a ring together, wherein the ring is substituted or unsubstituted, and a is an integer from 1 to 4.

Dependencies are inferred from the claim text.