Organometallic solution based high resolution patterning compositions and corresponding methods

A coating solution consisting essentially of an organic solvent and an organometallic composition comprising a first organometallic compound represented by the formula RSnO(3/2−x/2)(OH)x where (0<x<3), where R is an alkyl group, where the alkyl group is bonded to the tin at a secondary or tertiary carbon atom, and a second organometallic compound distinct from the first organometallic compound and represented by the formula R′SnO(3/2−x/2)(OH)x where (0<x<3), where R′ is a linear or branched alkyl group and wherein R and R′ are not the same.

A method for patterning a film on a substrate, the method comprising:

• exposing the film with patterned EUV doses of no more than about 80 mJ/cm2 wherein the film has an average thickness from about 2 nm to about 50 nm and wherein the film comprises a first organometallic compound represented by the formula RSnO(3/2−x/2)(OH)x where (0<x<3), where R is an alkyl group bonded to the tin;
• and
• developing the film to form features at half-pitch no more than about 25 nm and linewidth roughness no more than about 5 nm.

A method for patterning an organometallic film on a substrate, the method comprising:

• exposing the organometallic film to patterned EUV radiation at a dose-to-gel value of no more than about 15 mJ/cm2 to obtain a contrast of at least about 6.

A patterned structure comprising a substrate having a surface and a coating associated with the surface wherein at least portions of the coating are represented by the formulation (R)zSnO2−z/2−x/2(OH)x (z>0, x>0, and 0 <(x+z)<4), where R is an alkyl group bonded to the tin at a secondary or tertiary carbon atom, wherein the coating has an average thickness of no more than about 50 nm.