G03F 7/3021
From a wafer supported on a rotating chuck
Official title: {from a wafer supported on a rotating chuck}
G03F7/3021 (From a wafer supported on a rotating chuck) appears on 496 US grants and 416 published applications in this corpus.
Search patents in G03F- Granted patents
- 496
- Published applications
- 416
- Assignees
- 122
- Inventors
- 845
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 5 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 3 | 0 |
| 1988 | 2 | 0 |
| 1989 | 6 | 0 |
| 1990 | 4 | 0 |
| 1991 | 3 | 0 |
| 1992 | 1 | 0 |
| 1993 | 3 | 0 |
| 1994 | 7 | 0 |
| 1995 | 4 | 0 |
| 1996 | 8 | 0 |
| 1997 | 7 | 0 |
| 1998 | 16 | 0 |
| 1999 | 15 | 0 |
| 2000 | 14 | 0 |
| 2001 | 27 | 13 |
| 2002 | 17 | 18 |
| 2003 | 23 | 19 |
| 2004 | 26 | 22 |
| 2005 | 9 | 21 |
| 2006 | 13 | 14 |
| 2007 | 10 | 22 |
| 2008 | 10 | 20 |
| 2009 | 16 | 18 |
| 2010 | 16 | 16 |
| 2011 | 17 | 15 |
| 2012 | 12 | 15 |
| 2013 | 15 | 13 |
| 2014 | 13 | 18 |
| 2015 | 12 | 18 |
| 2016 | 16 | 13 |
| 2017 | 19 | 11 |
| 2018 | 16 | 21 |
| 2019 | 20 | 18 |
| 2020 | 17 | 21 |
| 2021 | 17 | 10 |
| 2022 | 11 | 14 |
| 2023 | 10 | 18 |
| 2024 | 9 | 12 |
| 2025 | 10 | 10 |
| 2026 | 10 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Apparatus for treating substrate and method for treating a substrate6 Oct 2026US 12,754,475 B2Semes Co., Ltd.
- Apparatus and method for processing substrate28 Jul 2026US 12,693,598 B2Semes Co., Ltd.
- Substrate treating method and substrate treating apparatus12 May 2026US 12,625,439 B2Semes Co., Ltd.
- Method of operating drippage prevention system28 Apr 2026US 12,611,694 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method and apparatus for reducing solvent consumption7 Apr 2026US 12,594,571 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Home port and apparatus for processing substrate with the same25 Jun 2026US 2026/0175248 A1Semes Co., Ltd.
- Substrate processing method and substrate processing apparatus18 Jun 2026US 2026/0169388 A1Tokyo Electron Limited
- Substrate processing method, substrate processing apparatus, and storage medium16 Apr 2026US 2026/0104646 A1Tokyo Electron Limited
- Substrate treating method12 Mar 2026US 2026/0072352 A1Imec Vzw
- Semiconductor manufacturing apparatus and method5 Mar 2026US 2026/0064004 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Substrate processing system, coating/developing apparatus, and substrate processing apparatus485US 7,379,785 B2Tokyo Electron Limited · 2008
- Coater/developer, coating/developing method, and storage medium469US 7,591,601 B2Tokyo Electron Limited · 2009
- Apparatus and method for developing process177US 9,256,133 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2016
- Method and apparatus for drying a substrate having a resist film with a miniaturized pattern122US 5,678,116 ADainippon Screen Mfg.Co., Ltd. · 1997
- Apparatus for coating a photo-resist film and/or developing it after being exposed112US 4,985,722 ATel Kyushu Limited · 1991