Home port and apparatus for processing substrate with the same

A home port, comprising:

• a housing including a receiving space for receiving a lower portion of a nozzle;
• a cleaning liquid supply path installed inside the housing and supplying a cleaning liquid to the receiving space;
• a suction path installed inside the housing and suctioning the cleaning liquid from the receiving space;
• and
• an ejector installed in the suction path, and controlling pressure within the suction path.

In an apparatus for processing a substrate, the apparatus, the apparatus including:

• a support unit for supporting a substate;
• a liquid supply unit including a nozzle for discharging a processing liquid onto a substrate supported by the support unit;
• and
• a home port located to be spaced apart from the support unit, and in which the nozzle is held,
• wherein the home port includes
• a housing including a receiving space in which a portion of the nozzle is received;
• a cleaning liquid supply unit for supplying a cleaning liquid for cleaning the nozzle to the receiving space;
• a suction unit for suctioning the cleaning liquid or air from the receiving space;
• and
• a drain unit for draining a cleaning liquid having overflowed from the receiving space and a cleaning liquid suctioned through the suction unit to the outside of the housing.