Pattern forming method and pattern forming apparatus using exposures in a liquid
AssigneeHitachi, Ltd.
InventorsMasamoto Akeyama, Yoshifumi Tomita, Saburo Nonogaki
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Abstract
A pattern forming method comprising a step of disposing a substrate with a coated film of photosensitive composition and a mask having a predetermined pattern in a first liquid which does not dissolve said coated film of photosensitive composition, and a step of exposing said coated film to light through said mask. An apparatus for attaining this method is also disclosed. The influence of dust can be readily avoided and an image with high resolution is obtained.
Claims14
A pattern forming method comprising a step of disposing a substrate with a coated film of photoresist forming photosensitive composition and a mask having a predetermined pattern in a first liquid which does not dissolve said coated film of photoresist forming photosensitive composition;
- a step of exposing said coated film to light through said mask with said coated film and said mask being disposed in said first liquid;
- and a step of moving said substrate with said coated film after exposure into a second liquid that is in contact with said first liquid, is not miscible with the first liquid, and has a developing effect to said coated film of photosensitive composition, said substrate being moved into the second liquid to develop said film therein.
Dependencies are inferred from the claim text.