G03F 7/20
Exposure
Official title: Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00)
G03F7/20 (Exposure) appears on 8,342 US grants and 9,497 published applications in this corpus.
Search patents in G03F- Granted patents
- 8,342
- Published applications
- 9,497
- Assignees
- 1,773
- Inventors
- 13,920
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 15 | 0 |
| 1977 | 13 | 0 |
| 1978 | 18 | 0 |
| 1979 | 23 | 0 |
| 1980 | 18 | 0 |
| 1981 | 31 | 0 |
| 1982 | 22 | 0 |
| 1983 | 25 | 0 |
| 1984 | 37 | 0 |
| 1985 | 31 | 0 |
| 1986 | 36 | 0 |
| 1987 | 38 | 0 |
| 1988 | 26 | 0 |
| 1989 | 50 | 0 |
| 1990 | 51 | 0 |
| 1991 | 38 | 0 |
| 1992 | 63 | 0 |
| 1993 | 54 | 0 |
| 1994 | 88 | 0 |
| 1995 | 66 | 0 |
| 1996 | 64 | 0 |
| 1997 | 80 | 0 |
| 1998 | 98 | 0 |
| 1999 | 131 | 0 |
| 2000 | 110 | 0 |
| 2001 | 135 | 49 |
| 2002 | 117 | 144 |
| 2003 | 119 | 132 |
| 2004 | 117 | 159 |
| 2005 | 86 | 185 |
| 2006 | 105 | 205 |
| 2007 | 83 | 224 |
| 2008 | 120 | 225 |
| 2009 | 118 | 231 |
| 2010 | 158 | 243 |
| 2011 | 165 | 280 |
| 2012 | 198 | 346 |
| 2013 | 270 | 503 |
| 2014 | 403 | 471 |
| 2015 | 510 | 517 |
| 2016 | 496 | 593 |
| 2017 | 476 | 601 |
| 2018 | 448 | 562 |
| 2019 | 520 | 626 |
| 2020 | 490 | 643 |
| 2021 | 439 | 454 |
| 2022 | 399 | 476 |
| 2023 | 334 | 438 |
| 2024 | 325 | 485 |
| 2025 | 294 | 397 |
| 2026 | 191 | 308 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/2002With visible light or uv light, through an original having an opaque2,810
- G03F 7/2022Multi-step exposure1,628
- G03F 7/2041In the presence of a fluid1,427
- G03F 7/2051Exposure without an original mask1,014
- G03F 7/2037Exposure with x-ray radiation or corpuscular radiation, through a mask with a439
- G03F 7/24Curved surfaces305
- G03F 7/22Exposing sequentially with the same light pattern different positions of the same68
- G03F 7/2045Using originals with apertures60
Recent patents
- Apparatus for treating substrate and method for treating a substrate6 Oct 2026US 12,754,475 B2Semes Co., Ltd.
- Photohardenable compositions and methods of forming an object6 Oct 2026US 12,754,478 B2Quadratic 3D, Inc.
- EUV resist underlayer film-forming composition6 Oct 2026US 12,754,479 B2Nissan Chemical Corporation
- UV lithography system and method6 Oct 2026US 12,754,480 B2The Regents of the University of California
- Hardmask composition, hardmask layer, and pattern forming method6 Oct 2026US 12,754,481 B2Samsung SDI.Co., Ltd.
- Lithography focus control method8 Oct 2026US 2026/0310070 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method and apparatus for fabrication of large area 3d photonic crystals with embedded waveguides8 Oct 2026US 2026/0310072 A1UNM Rainforest Innovations
- Resist composition and patterning process8 Oct 2026US 2026/0310074 A1Shin-Etsu Chemical Co., Ltd.
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process8 Oct 2026US 2026/0310075 A1Shin-Etsu Chemical Co., Ltd.
- Resist underlayer film-forming composition8 Oct 2026US 2026/0310081 A1Nissan Chemical Corporation
Most cited
By later US patents
- Photolithographic method for the manufacture of integrated circuits1,126US 4,346,164 A1982
- Pattern forming apparatus1,002US 4,480,910 AHitachi, Ltd. · 1984
- Method for optical inspection and lithography624US 5,900,354 A1999
- Apparatus and method for photoetching of polyimides, polycarbonates and polyetherimides552US 4,857,382 AGeneral Electric Company · 1989
- Semiconductor substrate process using an optically writable carbon-containing mask539US 7,429,532 B2APPLIED Materials.Inc. · 2008