G03F 7/2045
Using originals with apertures
Official title: {using originals with apertures, e.g. stencil exposure masks}
G03F7/2045 (Using originals with apertures) appears on 60 US grants and 65 published applications in this corpus.
Search patents in G03F- Granted patents
- 60
- Published applications
- 65
- Assignees
- 59
- Inventors
- 172
- Latest grant
- 21 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 3 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 2 | 1 |
| 2009 | 1 | 1 |
| 2010 | 1 | 0 |
| 2011 | 1 | 1 |
| 2012 | 0 | 0 |
| 2013 | 1 | 2 |
| 2014 | 2 | 7 |
| 2015 | 6 | 6 |
| 2016 | 7 | 6 |
| 2017 | 4 | 6 |
| 2018 | 2 | 5 |
| 2019 | 5 | 4 |
| 2020 | 4 | 2 |
| 2021 | 5 | 5 |
| 2022 | 2 | 4 |
| 2023 | 1 | 3 |
| 2024 | 2 | 5 |
| 2025 | 3 | 3 |
| 2026 | 4 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Shadow mask and method of manufacturing blank mask using the same21 Jul 2026US 12,687,772 B2LuminaMask Co., Ltd.
- Controlled printing surface and method of forming topographical features on a controlled printing surface9 Jun 2026US 12,649,264 B2Henkel AG & Co. KGaA
- Blanking aperture array system and multi charged particle beam writing apparatus5 May 2026US 12,620,545 B2NuFlare Technology, Inc.
- Printing plate exposure method and apparatus with reduced thermal polymerization10 Feb 2026US 12,547,077 B2Esko-Graphics Imaging GmbH
- Method of processing a substrate7 Oct 2025US 12,436,465 B2Nanya Technology Corporation
- Laser irradiation apparatus, laser processing apparatus, exposure apparatus, method for laser processing, method for exposure processing, method for installing mask, method for installing laser processing apparatus, method for installing exposure apparatus, and mask1 Oct 2026US 2026/0295721 A1Shin-Etsu Engineering Co., Ltd.
- Controlled printing surface and method of forming topographical features on a controlled printing surface11 Dec 2025US 2025/0375924 A1Henkel AG & Co. KGaA
- Screen mask for screen printing and manufacturing method of the same20 Nov 2025US 2025/0353292 A1Samsung Display Co., Ltd.
- Wafer bow compensation by patterned uv cure22 May 2025US 2025/0166991 A1Lam Research Corporation
- Materials and methods for dry resist technology7 Nov 2024US 2024/0369933 A1The Johns Hopkins University
Most cited
By later US patents
- Sub-wavelength aperture arrays with enhanced light transmission137US 5,973,316 ANEC Research Institute, Inc. · 1999
- Near-field scanning optical microscope having a sub-wavelength aperture array for enhanced light transmission102US 6,052,238 ANEC Research Institute, Inc. · 2000
- Method and an apparatus for illuminating points on a medium51US 5,579,240 ADicon A/S · 1996
- Apparatus and method for defining a pattern on a substrate30US 6,313,905 B1International Business Machines Corporation · 2001
- Mask processing using films with spatially selective birefringence reduction12US 9,423,545 B23M Innovative Properties Company · 2016