Shadow mask and method of manufacturing blank mask using the same

A shadow mask comprising:

• a mask comprising one surface, another surface, and an opening that passes from one surface to the other;
• a shutter provided on the one surface of the mask and configured to adjust a size of the opening;
• a detection unit provided on the one surface of the mask and configured to move linearly in response to a predetermined force;
• a transmission unit connected to the detection unit and the shutter, and configured to transmit a force to move the shutter when a predetermined force is applied to the detection unit;
• a vertical guide rail in a portion of an inner space of the mask, and a horizontal guide rail in the other portion of the inner space of the mask;
• a vertical opening rail which is provided between the mask and the vertical shutter and through which the portion of the inner space of the mask is open;
• and
• a horizontal opening rail which is provided between the mask and the horizontal shutter and through which the other portion of the inner space of the mask is open,
• wherein the shutter is configured to move from an edge to a center of the opening to adjust the size of the opening,
• wherein the shadow mask is applied in manufacturing a blank mask for a semiconductor lithography process,
• wherein the opening has the same rectangular shape as the blank mask,
• wherein the shutter comprises:
• a vertical shutter configured to move to the center of the opening from upper and lower sides or return therefrom;
• and
• a horizontal shutter configured to move to the center of the opening from left and right sides or return therefrom,
• wherein the vertical and horizontal shutters are configured to be positioned at such a height that the vertical and horizontal shutters do not interfere with each other as they move to the center of the opening or return therefrom,
• wherein a first groove portion is positioned at a partial path of the vertical guide rail and a second groove portion is positioned at a partial path of the horizontal guide rail,
• wherein the vertical shutter comprises a first sliding portion configured to move while being engaged with the vertical guide rail, and a first support configured to connect the first sliding portion and the vertical shutter,
• wherein the horizontal shutter comprises a second sliding portion configured to move while being engaged with the horizontal guide rail, and a second support configured to connect the second sliding portion and the horizontal shutter, and
• wherein the first sliding portion is fixedly engaged with the first groove portion, and the second sliding portion is fixedly engaged with the second groove portion.