G03F 7/2047
Exposure with radiation other than visible light or uv light
Official title: {Exposure with radiation other than visible light or UV light, e.g. shadow printing, proximity printing}
G03F7/2047 (Exposure with radiation other than visible light or uv light) appears on 26 US grants and 28 published applications in this corpus.
Search patents in G03F- Granted patents
- 26
- Published applications
- 28
- Assignees
- 26
- Inventors
- 88
- Latest grant
- 21 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 2 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 1 | 1 |
| 2009 | 1 | 1 |
| 2010 | 1 | 0 |
| 2011 | 1 | 1 |
| 2012 | 0 | 0 |
| 2013 | 1 | 0 |
| 2014 | 1 | 2 |
| 2015 | 2 | 1 |
| 2016 | 0 | 0 |
| 2017 | 0 | 2 |
| 2018 | 1 | 2 |
| 2019 | 3 | 4 |
| 2020 | 3 | 2 |
| 2021 | 3 | 2 |
| 2022 | 2 | 2 |
| 2023 | 1 | 2 |
| 2024 | 1 | 4 |
| 2025 | 1 | 0 |
| 2026 | 2 | 0 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Shadow mask and method of manufacturing blank mask using the same21 Jul 2026US 12,687,772 B2LuminaMask Co., Ltd.
- Printing plate exposure method and apparatus with reduced thermal polymerization10 Feb 2026US 12,547,077 B2Esko-Graphics Imaging GmbH
- Method of processing a substrate7 Oct 2025US 12,436,465 B2Nanya Technology Corporation
- Method of making a picoscopic scale/ nanoscopic scale circuit pattern9 Apr 2024US 11,953,828 B2Longserving Technology Co., Ltd
- Method for making photolithography mask plate5 Sep 2023US 11,747,730 B2Hon Hai Precision Industry Co., Ltd.
- Materials and methods for dry resist technology7 Nov 2024US 2024/0369933 A1The Johns Hopkins University
- Physically detectable id introduced by lithography sraf insertion for heterogeneous integration20 Jun 2024US 2024/0201583 A1International Business Machines Corporation
- Printing plate exposure method and apparatus with reduced thermal polymerization11 Apr 2024US 2024/0118624 A1Esko-Graphics Imaging GmbH
- Method of processing a substrate4 Jan 2024US 2024/0004300 A1Nanya Technology Corporation
- Shadow mask and method of manufacturing blank mask using the same21 Dec 2023US 2023/0408903 A1SK enpulse Co., Ltd.
Most cited
By later US patents
- Apparatus and method for defining a pattern on a substrate30US 6,313,905 B1International Business Machines Corporation · 2001
- Extreme ultraviolet/soft X-ray laser nano-scale patterning using the demagnified talbot effect10US 9,007,562 B2Colorado State University Research Foundation · 2015
- Method and system for controlled ultraviolet light exposure5US 9,971,249 B1Canon Kabushiki Kaisha · 2018
- Chemical liquid, chemical liquid storage body, and pattern forming method4US 11,079,677 B2FUJIFILM Corporation · 2021
- Resist composition, and method of forming resist pattern4US 11,256,169 B2Tokyo Ohka Kogyo.Co., Ltd. · 2022