Resist composition, and method of forming resist pattern

A resist composition that generates an acid upon exposure and exhibits a changed solubility in a developing solution under the action of an acid, comprising:

• a resin component (A1) that exhibits a changed solubility in a developing solution under the action of an acid and a compound (BD1) which is represented by the following general formula (bd1) and has an anion moiety and a cation moiety,
• wherein the resin component (A1) contains the following resin component (a) or (b):
• the resin component (a) having a structural unit (a0-1a) in which a polymerizable group at the W1 site in a compound represented by the following general formula (a0-1a-1) is converted into a main;
• or
• the resin component (b), provided that the resin component (a) is excluded, having a structural unit (a0-1b) in which a polymerizable group at the W1 in a compound represented by the following general formula (a0-1b-1) is converted into a main chain and at least one structural unit selected from the group consisting of a structural unit (a0-2) in which a polymerizable group at the W2 site in the compound represented by the following general formula (a0-2-1) is converted into a main chain, and a structural unit (a0-3) having a partial structure represented by the following general formula (a0-3):
• wherein Rx1 to Rx4 each independently represent a hydrocarbon group which may have a substituent or a hydrogen atom, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure;
• Ry1 to Ry2 each independently represent a hydrocarbon group which may have a substituent or a hydrogen atom, or may be mutually bonded to form a ring structure;
• is a double bond or a single bond;
• Rz1 to Rz4 each independently represent, where valence allows, a hydrocarbon group which may have a substituent or a hydrogen atom, provided that two or more of Rz1 to Rz4 are mutually bonded to form a ring structure, provided that at least one of Rx1 to Rx4, Ry1 to Ry2 and Rz1 to Rz4 has an anion group, and the entire anion moiety may be an n-valent anion;
• n is an integer of 1 or more;
• and m is an integer of 1 or more and Mm+ represents an m-valent organic cation, and
• wherein W1 represents a polymerizable group-containing group;
• Ra01a represents an acid dissociable group which has a carbon atom constituting a carbon-carbon unsaturated bond at the α-position of a carbon atom which is bonded to the oxy group (—O—) in the general formula (a0-1a-1);
• and Ra01b represents an acid dissociable group represented by the following general formula (a01-r-1) or general formula (a01-r-2), and
• wherein Ra011 to Ra013 each independently represent a linear or branched aliphatic hydrocarbon group, an alicyclic group having no crosslinked structure, or an aromatic hydrocarbon group;
• Ra014 represents a linear or branched aliphatic hydrocarbon group having 1 to 12 carbon atoms in which some atoms may be substituted with a halogen atom or a hetero atom-containing group or an aryl group having 6 to 12 carbon atoms in which some atoms may be substituted with a halogen atom or a hetero atom-containing group;
• Ra015 represents a group that forms a monocyclic aliphatic cyclic group together with a carbon atom to which Ra014 is bonded;
• and * indicates a bond, and
• wherein W2 represents a polymerizable group-containing group;
• Wax0 represents an (nax0+1)-valent aromatic cyclic group which may have a substituent;
• Wax0 may form a condensed ring with W2;
• and nax0 is an integer of 1 to 3, and
• wherein R1 represents a fluorinated alkyl group having 1 to 12 carbon atoms;
• R2 represents an organic group having 1 to 12 carbon atoms which may have a fluorine atom, or a hydrogen atom;
• and * indicates a bond.