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US 11,747,730 B2Granted
Method for making photolithography mask plate
AssigneesTsinghua University, Hon Hai Precision Industry Co., Ltd.
InventorsMo Chen, Qun-Qing Li, Li-Hui Zhang, Yuan-Hao Jin, Dong An, Shou-Shan Fan
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Abstract
A method of making photolithography mask plate is provided. The method includes: providing a chrome layer on a substrate; depositing a carbon nanotube layer on the chrome layer to expose a part of a surface of the chrome layer; etching the chrome layer with the carbon nanotube layer as a mask to obtain a patterned chrome layer; and depositing a cover layer on the carbon nanotube layer.
Claims16
A method of making photolithography mask plate, comprising:
- providing a chrome layer located on a substrate;
- depositing a carbon nanotube layer on the chrome layer to expose a part of a surface of the chrome layer;
- etching the chrome layer to expose a part of the substrate to obtain a patterned chrome layer;
- and
- depositing a cover layer on the carbon nanotube layer, wherein the cover layer is a continuous layer structure and completely covers both the carbon nanotube layer and the part of the substrate.
2 more elements
A method of making photolithography mask plate, comprising:
- providing a chrome layer located on a substrate;
- depositing a carbon nanotube layer on the chrome layer, wherein the carbon nanotube layer defines a plurality of holes;
- etching the chrome layer to obtain a patterned chrome layer, wherein a partial surface of the substrate is exposed through the plurality of holes;
- and
- depositing a cover layer on a surface of the carbon nanotube layer away from the patterned chrome layer, wherein the cover layer completely covers the carbon nanotube layer, the patterned chrome layer and the partial surface of the substrate.
2 more elements
Dependencies are inferred from the claim text.