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US 2023/0408903 A1Published application
Shadow mask and method of manufacturing blank mask using the same
AssigneeSK enpulse Co., Ltd.
InventorsSeong Yoon KIM, GeonGon LEE, Min Gyo JEONG, Sung Hoon SON, Inkyun SHIN
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Abstract
A shadow mask includes a mask including one surface, another surface, and an opening that passes from one surface to the other, and a shutter provided on the one surface of the mask and configured to adjust a size of the opening, wherein the shutter is configured to move from an edge to a center of the opening to adjust the size of the opening, and the shadow mask is applied in manufacturing a blank mask for a semiconductor lithography process.
Claims13
A shadow mask comprising:
- a mask comprising one surface, another surface, and an opening that passes from one surface to the other;
- and
- a shutter provided on the one surface of the mask and configured to adjust a size of the opening,
- wherein the shutter is configured to move from an edge to a center of the opening to adjust the size of the opening, and
- wherein the shadow mask is applied in manufacturing a blank mask for a semiconductor lithography process.
2 more elements
A method of manufacturing a blank mask, the method comprising:
- providing a film formation apparatus to which a shadow mask is applied;
- and
- forming a film as a target layer in the film formation apparatus,
- wherein the shadow mask comprises:
- a mask comprising one surface, another surface, and an opening that passes from one surface to the other;
- and
- a shutter provided on the one surface of the mask and configured to adjust a size of the opening, and
- wherein the shutter is configured to move from an edge to a center of the opening to adjust the size of the opening, and is applied in manufacturing the blank mask for a semiconductor lithography process.
5 more elements
Dependencies are inferred from the claim text.