Blanking aperture array system and multi charged particle beam writing apparatus

A multi charged particle beam writing apparatus comprising:

• a charged particle beam source that emits a charged particle beam;
• a shaping aperture array substrate including a plurality of openings, and forming a multi charged particle beam by part of the charged particle beam passing through the plurality of openings from upstream to downstream;
• a blanking aperture array substrate including a plurality of beam passage holes, through which beams in the multi charged particle beam pass from upstream to downstream, the plurality of beam passage holes being provided with respective blankers that perform blanking deflection on the beams;
• a first radiation shield disposed upstream of the blanking aperture array substrate;
• and
• a second radiation shield disposed downstream of the blanking aperture array substrate,
• wherein a cell section including the beam passage holes and the blankers is provided in a central part of the blanking aperture array substrate, and a circuit section including a circuit element that applies a voltage to each of the blankers is disposed closer to a peripheral edge of the blanking aperture array substrate than the cell section,
• the first radiation shield includes a first plate covering over the circuit section, disposed on an upper surface of the blanking aperture array substrate, provided with a first opening for passage of the multi charged particle beam, and extending from a peripheral edge of the first opening, and
• the second radiation shield covers under the circuit section, and is provided with a lower opening for passage of the multi charged particle beam, the second radiation shield including a lower peripheral wall section that hangs down from a lower surface of the blanking aperture array substrate and surrounds the cell section, and a lower plate extending from a peripheral edge of the lower opening.