Apparatus and method for photoetching of polyimides, polycarbonates and polyetherimides
AssigneeGeneral Electric Company
InventorsYung S. Liu, Willard T. Grubb
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Abstract
Polyimides, polycarbonates, polyetherimides and other highly stable organic polymers are photoetched through the use of deep ultraviolet light produced by a broad area, non-coherent, continuous light source. This method is effective in an oxygen-free environment, but provides slightly higher etch rates in an air ambient as a result of the oxygen in the air ambient. The apparatus in which this photoetching occurs may employ a single light source or a plurality of side-by-side lamps and may include ports which allow continuous transport of samples therethrough.
Claims24
A method of etching, by photodecomposition, an organic polymer selected from the group consisting of polyimides, polycarbonates and polyetherimides, comprising:
- providing a broad area source of continuous ultraviolet light in the form of a high-current-density mercury lamp operating at a current density of at least 1.0 amp/cm.sup.2 of lamp internal cross-sectional area, said ultraviolet light including wavelengths shorter than 200 nanometers;
- and
- exposing the portion of said polymer to be etched to the broad area continuous ultraviolet light emanating from said source.
A method of etching, by photodecomposition, an organic polymer selected from the group consisting of polyimides, polycarbonates and polyetherimides, comprising:
- providing a high-current-density mercury lamp operating at a current density of at least 1.0 amp/cm.sup.2 of lamp internal cross-sectional area as a broad area source of continuous ultraviolet light, said ultraviolet light including wavelengths shorter than 200 nanometers;
- disposing at least the portion of said polymer to be etched in an environment which is free of molecular oxygen and ozone;
- and
- exposing the portion of said polymer to be etched to the broad area continuous ultraviolet light emanating from said lamp.
A method of etching, by photodecomposition, an organic polymer selected from the group consisting of polyimides, polycarbonates and polyetherimides, comprising:
- providing a broad area source of continuous ultraviolet light, and ultraviolet light including wavelengths shorter than 200 nanometers;
- disposing at least the portion of said polymer to be etched in an environment which is free of molecular oxygen and ozone;
- and
- exposing the portion of said polymer to be etched to the broad area continuous ultraviolet light emanating from said source.
Etching apparatus for photoetching a sample comprising:
- means for supporting said sample;
- a high-current-density mercury lamp disposed to illuminate said sample with ultraviolet light;
- and
- control means for operating said lamp at a current density in excess of 1.0 amp/cm.sup.2 of lamp internal cross-sectional area.
The etching apparatus recited in claim 21 comprising:
- a plurality of said high-current-density mercury lamps.
Dependencies are inferred from the claim text.