Hardmask composition, hardmask layer, and pattern forming method

A pattern forming method, the method comprising:

• applying a hardmask composition comprising a compound represented by Chemical Formula 1 and a solvent on a material layer and heat-treating the resultant to form a hardmask layer,
• forming a photoresist layer on the hardmask layer,
• exposing and developing the photoresist layer to form a photoresist pattern,
• selectively removing the hardmask layer using the photoresist pattern to expose a portion of the material layer, and
• etching an exposed part of the material layer:
• wherein, in Chemical Formula 1,
• A is a C6 to C30 aromatic moiety,
• R1 to R5 are each independently hydrogen, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 heteroaryl group, or a combination thereof or a group represented by Chemical Formula 4,
• at least one of R1 to R5 is a group represented by Chemical Formula 4,
• at least one of R1 to R5 not represented by Chemical Formula 4 is a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 heteroaryl group, or a combination thereof, and
• n is an integer greater than or equal to 2,
• wherein, in Chemical Formula 4,
• X is a substituted or unsubstituted C6 to C30 arylene group,
• R6 to R10 of Chemical Formula 4 are each independently a substituted or unsubstituted C3 to C30 nitrogen-containing heteroaryl group selected from Group 6 or a substituted or unsubstituted C6 to C30 aryl group selected from Group 7, and
• at least one of R7, R8, and R10 is a substituted or unsubstituted C3 to C30 nitrogen-containing heteroaryl group selected from Group 6;
• or a C6 to C30 aryl group substituted with a substituted or unsubstituted C1 to C30 alkoxy group, a substituted or unsubstituted C1 to C30 alkylthiol group, a substituted or unsubstituted C1 to C20 alkylamine group, or a combination thereof which is selected from Group 7:
• ’ indicates a linking point with Chemical Formula 1, and
• provided that when A of Chemical Formula 1 is a C6 aromatic moiety, at least one of R6 to R10 of Chemical Formula 4 is a substituted or unsubstituted C3 to C30 nitrogen-containing heteroaryl group that is not a pyridine group;
• or a C6 to C30 aryl group substituted with a hydroxy group, an amine group, a mercapto group, a substituted or unsubstituted C1 to C30 alkylthiol group, a substituted or unsubstituted C1 to C20 alkylamine group, or a combination thereof.