G03F 7/2041
In the presence of a fluid
Official title: {in the presence of a fluid, e.g. immersion; using fluid cooling means}
G03F7/2041 (In the presence of a fluid) appears on 1,427 US grants and 1,785 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,427
- Published applications
- 1,785
- Assignees
- 196
- Inventors
- 1,619
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 0 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 4 | 0 |
| 1993 | 0 | 0 |
| 1994 | 5 | 0 |
| 1995 | 3 | 0 |
| 1996 | 3 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 5 | 0 |
| 2000 | 4 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 2 |
| 2003 | 0 | 3 |
| 2004 | 0 | 12 |
| 2005 | 3 | 48 |
| 2006 | 13 | 71 |
| 2007 | 12 | 108 |
| 2008 | 42 | 100 |
| 2009 | 51 | 112 |
| 2010 | 59 | 116 |
| 2011 | 83 | 121 |
| 2012 | 87 | 187 |
| 2013 | 120 | 178 |
| 2014 | 175 | 115 |
| 2015 | 167 | 104 |
| 2016 | 142 | 116 |
| 2017 | 93 | 80 |
| 2018 | 71 | 57 |
| 2019 | 65 | 57 |
| 2020 | 46 | 44 |
| 2021 | 39 | 28 |
| 2022 | 32 | 22 |
| 2023 | 32 | 29 |
| 2024 | 18 | 28 |
| 2025 | 21 | 22 |
| 2026 | 14 | 25 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Photohardenable compositions and methods of forming an object6 Oct 2026US 12,754,478 B2Quadratic 3D, Inc.
- Substrate processing apparatus for processing a substrate in one process chamber8 Sep 2026US 12,730,387 B2Samsung Electronics Co., Ltd.
- Immersion fluid recovery system and immersion fluid recovery method using said system25 Aug 2026US 12,717,241 B2Zhejiang Cheer Technology Co., Ltd.
- Method of operating semiconductor apparatus25 Aug 2026US 12,717,242 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate treatment method, storage medium, and substrate treatment apparatus11 Aug 2026US 12,704,779 B2Tokyo Electron Limited
- Method and apparatus for fabrication of large area 3d photonic crystals with embedded waveguides8 Oct 2026US 2026/0310072 A1UNM Rainforest Innovations
- Semiconductor method of manufacture and layer composition1 Oct 2026US 2026/0299424 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography process monitoring method17 Sep 2026US 2026/0277124 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Photohardenable compositions and methods of forming an object3 Sep 2026US 2026/0259492 A1Quadratic 3D, Inc.
- Resist composition, resist pattern formation method, compound, and polymer compound13 Aug 2026US 2026/0235949 A1Tokyo Ohka Kogyo.Co., Ltd.
Most cited
By later US patents
- Photolithographic method for the manufacture of integrated circuits1,126US 4,346,164 A1982
- Pattern forming apparatus1,002US 4,480,910 AHitachi, Ltd. · 1984
- Method for optical inspection and lithography624US 5,900,354 A1999
- Pattern forming method and pattern forming apparatus using exposures in a liquid466US 4,396,705 AHitachi, Ltd. · 1983
- Pattern forming method by imparting hydrogen atoms and selectively depositing metal film373US 5,861,233 ACanon Kabushiki Kaisha · 1999