G03F 7/2043
With the production of a chemical active agent from a fluid
Official title: {with the production of a chemical active agent from a fluid, e.g. an etching agent; with meterial deposition from the fluid phase, e.g. contamination resists}
G03F7/2043 (With the production of a chemical active agent from a fluid) appears on 75 US grants and 74 published applications in this corpus.
Search patents in G03F- Granted patents
- 75
- Published applications
- 74
- Assignees
- 58
- Inventors
- 232
- Latest grant
- 24 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 4 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 3 |
| 2004 | 0 | 2 |
| 2005 | 0 | 1 |
| 2006 | 3 | 4 |
| 2007 | 1 | 4 |
| 2008 | 1 | 1 |
| 2009 | 3 | 3 |
| 2010 | 2 | 0 |
| 2011 | 3 | 2 |
| 2012 | 1 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 1 |
| 2017 | 1 | 3 |
| 2018 | 1 | 1 |
| 2019 | 3 | 11 |
| 2020 | 4 | 11 |
| 2021 | 7 | 3 |
| 2022 | 7 | 5 |
| 2023 | 4 | 8 |
| 2024 | 3 | 5 |
| 2025 | 6 | 3 |
| 2026 | 1 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Composition for forming organic film, patterning process, and compound24 Mar 2026US 12,584,023 B2Shin-Etsu Chemical Co., Ltd.
- Film-forming composition9 Dec 2025US 12,493,243 B2Nissan Chemical Corporation
- Method for forming continuous line-end to line-end spaces with spacer assisted lithography-etch-lithography etch processes28 Oct 2025US 12,455,505 B2International Business Machines Corporation
- Substrate processing apparatus and method of manufacturing semiconductor device using the same28 Oct 2025US 12,455,510 B2Samsung Electronics Co., Ltd.
- Apparatus for treating substrate and method for treating substrate9 Sep 2025US 12,412,767 B2Semes Co., Ltd.
- Semiconductor photoresist composition and method of forming patterns using the composition12 Mar 2026US 2026/0072347 A1Samsung SDI.Co., Ltd.
- Developing method, developing apparatus, and storage medium22 Jan 2026US 2026/0023324 A1Tokyo Electron Limited
- Multipatterning with crosslinkable overcoat2 Oct 2025US 2025/0306468 A1Tokyo Electron Limited
- Conductive post with footing profile2 Oct 2025US 2025/0309167 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Silicon-containing resist underlayer film forming composition6 Feb 2025US 2025/0044692 A1Nissan Chemical Corporation
Most cited
By later US patents
- Pattern forming method by imparting hydrogen atoms and selectively depositing metal film373US 5,861,233 ACanon Kabushiki Kaisha · 1999
- Method of molecular-scale pattern imprinting at surfaces209US 6,319,566 B12001
- Photodeposition method for fabricating a three-dimensional, patterned polymer microstructure185US 6,200,737 B1Trustees of Tufts College · 2001
- Photoreactive surface processing160US 5,669,979 AUVTech Systems, Inc. · 1997
- Radiation induced pattern deposition67US 4,895,735 ATexas Instruments Incorporated · 1990