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US 2026/0072347 A1Published application
Semiconductor photoresist composition and method of forming patterns using the composition
AssigneeSamsung SDI Co., Ltd.
InventorsKyoungjin HA, Ran NAMGUNG, Hyeon PARK, Daeseok SONG
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Abstract
A semiconductor photoresist composition and a method of forming patterns using the semiconductor photoresist composition are provided. The semiconductor photoresist composition includes an organometallic compound; a (meth)acrylate-based polymer including at least one selected from among metals each having a valence of 2 to 6; and a solvent.
Claims16
A semiconductor photoresist composition, comprising
- an organometallic compound;
- a (meth)acrylate-based polymer comprising at least one selected from among metals each having a valence of 2 to 6;
- and
- a solvent.
1 more element
Dependencies are inferred from the claim text.