G03F 7/2051
Exposure without an original mask
Official title: {Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source (G03F7/70 takes precedence)}
G03F7/2051 (Exposure without an original mask) appears on 1,014 US grants and 1,154 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,014
- Published applications
- 1,154
- Assignees
- 479
- Inventors
- 2,239
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 2 | 0 |
| 1984 | 5 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 1 | 0 |
| 1988 | 3 | 0 |
| 1989 | 6 | 0 |
| 1990 | 3 | 0 |
| 1991 | 2 | 0 |
| 1992 | 8 | 0 |
| 1993 | 8 | 0 |
| 1994 | 6 | 0 |
| 1995 | 5 | 0 |
| 1996 | 9 | 0 |
| 1997 | 9 | 0 |
| 1998 | 13 | 0 |
| 1999 | 18 | 0 |
| 2000 | 19 | 0 |
| 2001 | 15 | 10 |
| 2002 | 17 | 26 |
| 2003 | 12 | 27 |
| 2004 | 27 | 42 |
| 2005 | 17 | 30 |
| 2006 | 29 | 25 |
| 2007 | 19 | 19 |
| 2008 | 24 | 32 |
| 2009 | 15 | 18 |
| 2010 | 17 | 22 |
| 2011 | 13 | 36 |
| 2012 | 25 | 44 |
| 2013 | 40 | 65 |
| 2014 | 42 | 57 |
| 2015 | 60 | 48 |
| 2016 | 51 | 95 |
| 2017 | 61 | 68 |
| 2018 | 68 | 70 |
| 2019 | 44 | 59 |
| 2020 | 55 | 83 |
| 2021 | 57 | 60 |
| 2022 | 40 | 56 |
| 2023 | 42 | 43 |
| 2024 | 41 | 47 |
| 2025 | 34 | 43 |
| 2026 | 24 | 29 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Methods of forming an object in a volume of a photohardenable composition, photohardenable compositions, and photoinitiators25 Aug 2026US 12,715,998 B2Quadratic 3D, Inc.
- Active linear motor parasitic force compensation25 Aug 2026US 12,717,250 B2APPLIED Materials.Inc.
- Resist material and pattern forming method28 Jul 2026US 12,692,218 B2Oji Holdings Corporation
- Method and system for determining a charged particle beam exposure for a local pattern density21 Jul 2026US 12,688,998 B2D2S, Inc.
- System and method to control defects in projection-based sub-micrometer additive manufacturing23 Jun 2026US 12,663,722 B2Georgia Tech Research Corporation
- Data processing method, charged particle beam writing method, charged particle beam writing apparatus, and computer readable recording medium1 Oct 2026US 2026/0299425 A1NuFlare Technology, Inc.
- Drawing method and drawing device1 Oct 2026US 2026/0299426 A1SCREEN Holdings Co., Ltd.
- Digital lithography exposure unit boundary smoothing1 Oct 2026US 2026/0299433 A1APPLIED Materials.Inc.
- Method for smoother tonal response in flexographic printing17 Sep 2026US 2026/0273977 A1Esko Software BV
- Cluster compound or salt thereof and photoresist composition including the same10 Sep 2026US 2026/0267224 A1Industry Foundation of Chonnam National University
Most cited
By later US patents
- Pattern forming method by imparting hydrogen atoms and selectively depositing metal film373US 5,861,233 ACanon Kabushiki Kaisha · 1999
- Method of molecular-scale pattern imprinting at surfaces209US 6,319,566 B12001
- Method for forming a pattern and forming a thin film used in pattern formation196US 5,512,328 AHitachi, Ltd. · 1996
- Free-form fabricaton using multi-photon excitation185US 6,316,153 B1University of Connecticut · 2001
- Microstructure synthesis by flow lithography and polymerization115US 7,709,544 B2Massachusetts Institute of Technology · 2010