G03F 7/2059
Using a scanning corpuscular radiation beam
Official title: {using a scanning corpuscular radiation beam, e.g. an electron beam}
G03F7/2059 (Using a scanning corpuscular radiation beam) appears on 415 US grants and 450 published applications in this corpus.
Search patents in G03F- Granted patents
- 415
- Published applications
- 450
- Assignees
- 181
- Inventors
- 836
- Latest grant
- 28 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 2 | 0 |
| 1983 | 2 | 0 |
| 1984 | 3 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 4 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 4 | 0 |
| 1994 | 1 | 0 |
| 1995 | 4 | 0 |
| 1996 | 3 | 0 |
| 1997 | 4 | 0 |
| 1998 | 2 | 0 |
| 1999 | 6 | 0 |
| 2000 | 7 | 0 |
| 2001 | 5 | 1 |
| 2002 | 5 | 3 |
| 2003 | 1 | 5 |
| 2004 | 4 | 7 |
| 2005 | 2 | 5 |
| 2006 | 3 | 3 |
| 2007 | 3 | 2 |
| 2008 | 6 | 11 |
| 2009 | 1 | 3 |
| 2010 | 4 | 6 |
| 2011 | 6 | 13 |
| 2012 | 12 | 16 |
| 2013 | 15 | 37 |
| 2014 | 25 | 32 |
| 2015 | 36 | 27 |
| 2016 | 26 | 49 |
| 2017 | 36 | 40 |
| 2018 | 34 | 35 |
| 2019 | 25 | 23 |
| 2020 | 26 | 32 |
| 2021 | 29 | 18 |
| 2022 | 15 | 17 |
| 2023 | 18 | 18 |
| 2024 | 8 | 16 |
| 2025 | 10 | 15 |
| 2026 | 9 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Resist material and pattern forming method28 Jul 2026US 12,692,218 B2Oji Holdings Corporation
- Method and system for determining a charged particle beam exposure for a local pattern density21 Jul 2026US 12,688,998 B2D2S, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus16 Jun 2026US 12,658,405 B2NuFlare Technology, Inc.
- Shadow walls for use in fabricating devices19 May 2026US 12,635,428 B2Microsoft Technology Licensing, LLC
- Manufacturing of test structures using e-beam lithography for use in characterization and quality control of metrology tools used in semiconductor manufacturing5 May 2026US 12,619,163 B1Corporation for National Research Initiatives
- Data processing method, charged particle beam writing method, charged particle beam writing apparatus, and computer readable recording medium1 Oct 2026US 2026/0299425 A1NuFlare Technology, Inc.
- Cluster compound or salt thereof and photoresist composition including the same10 Sep 2026US 2026/0267224 A1Industry Foundation of Chonnam National University
- Chemically amplified positive resist composition and resist pattern forming process10 Sep 2026US 2026/0267226 A1Shin-Etsu Chemical Co., Ltd.
- Resist underlayer film-forming composition containing polycyclic aromatic-containing polymer3 Sep 2026US 2026/0259502 A1Nissan Chemical Corporation
- Resist underlayer film-forming composition for reducing environmental load6 Aug 2026US 2026/0227700 A1Nissan Chemical Corporation
Most cited
By later US patents
- Pattern forming method by imparting hydrogen atoms and selectively depositing metal film373US 5,861,233 ACanon Kabushiki Kaisha · 1999
- Method of molecular-scale pattern imprinting at surfaces209US 6,319,566 B12001
- Method for forming a pattern and forming a thin film used in pattern formation196US 5,512,328 AHitachi, Ltd. · 1996
- Grating fabrication using electron beam lithography91US 5,413,884 AAmerican Telephone and Telegraph Company · 1995
- Method for three-dimensional control of solubility properties of resist layers61US 5,468,595 AElectron Vision Corporation · 1995