G03F 7/2063
For the production of exposure masks or reticles
Official title: {for the production of exposure masks or reticles}
G03F7/2063 (For the production of exposure masks or reticles) appears on 64 US grants and 74 published applications in this corpus.
Search patents in G03F- Granted patents
- 64
- Published applications
- 74
- Assignees
- 25
- Inventors
- 72
- Latest grant
- 10 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2010 | 0 | 2 |
| 2011 | 3 | 4 |
| 2012 | 4 | 6 |
| 2013 | 4 | 11 |
| 2014 | 7 | 9 |
| 2015 | 10 | 9 |
| 2016 | 8 | 6 |
| 2017 | 8 | 5 |
| 2018 | 2 | 6 |
| 2019 | 5 | 1 |
| 2020 | 0 | 3 |
| 2021 | 3 | 5 |
| 2022 | 3 | 2 |
| 2023 | 4 | 5 |
| 2024 | 1 | 0 |
| 2025 | 0 | 0 |
| 2026 | 2 | 0 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Exposure mask and method of manufacturing display device using the same10 Feb 2026US 12,547,078 B2Samsung Display Co., Ltd.
- Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method27 Jan 2026US 12,537,163 B2NuFlare Technology, Inc.
- Lithography exposure system with debris removing mechanism4 Jun 2024US 12,001,143 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Exposure machine and exposure method26 Dec 2023US 11,852,976 B2Changxin Memory Technologies, Inc.
- Lithography exposure method with debris removing mechanism12 Sep 2023US 11,754,928 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Exposure mask and method of manufacturing display device using the same7 Dec 2023US 2023/0393482 A1Samsung Display Co., Ltd.
- Mask blank, resist pattern forming process and chemically amplified positive resist composition16 Nov 2023US 2023/0367213 A1Shin-Etsu Chemical Co., Ltd.
- Drawing method, master plate manufacturing method, and drawing apparatus15 Jun 2023US 2023/0185188 A1Kioxia Corporation
- Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method15 Jun 2023US 2023/0187172 A1NuFlare Technology, Inc.
- Exposure machine and exposure method8 Jun 2023US 2023/0176483 A1Changxin Memory Technologies, Inc.
Most cited
By later US patents
- Method and system for design of a reticle to be manufactured using variable shaped beam lithography61US 7,901,850 B2D2S, Inc. · 2011
- Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages19US 8,221,939 B2D2S, Inc. · 2012
- Method and system for design of a reticle to be manufactured using variable shaped beam lithography19US 8,828,628 B2D2S, Inc. · 2014
- Method, device, and system for forming circular patterns on a surface18US 8,354,207 B2D2S, Inc. · 2013
- Method for forming circular patterns on a surface17US 8,900,778 B2D2S, Inc. · 2014