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US 12,547,078 B2Granted
Exposure mask and method of manufacturing display device using the same
AssigneeSamsung Display Co., Ltd.
InventorsSoohong Cheon, Hyungjin Song
Life of this patent
Estimating the term…
Abstract
An exposure mask includes a base layer including a first area and a second area spaced apart from a first area in a first direction, a first inspection transmission pattern defined in a first area of a base layer and arranged in a ring shape having at least one connection part in plan view, and a second inspection transmission pattern defined in a second area of a base layer and arranged in a polygonal shape or a circular shape in plan view.
Claims10
An exposure mask comprising:
- a mask base layer comprising a first area and a second area spaced apart from the first area in a first direction;
- a first inspection transmission pattern formed in the first area of the mask base layer, the first inspection transmission pattern comprising:
- a plurality of optical transmission parts spaced apart and arranged in a ring shape, and
- at least one connection part between the plurality of optical transmission parts in plan view;
- and
- a second inspection transmission pattern formed in the second area of the mask base layer and arranged in a polygonal shape or a circular shape in plan view,
- wherein the plurality of optical transmission parts are point-symmetric with respect to a central point of the first inspection transmission pattern in plan view.
4 more elements
Dependencies are inferred from the claim text.