Exposure machine and exposure method

An exposure machine, comprising:

• a detection module, configured to detect whether there are attachments on a surface of a reticle;
• a cleaning device, configured to clean the attachments on the surface of the reticle, and the cleaning device being arranged in the detection module;
• and
• an exposure module, configured to expose the reticle having no attachments detected;
• wherein
• the cleaning device comprises a housing and a support frame provided on the housing, the support frame is provided with multiple gas sprayers configured to spray gas to the reticle to clean the reticle;
• the multiple gas sprayers are oppositely arranged on the support frame, and configured to blow gas to two opposite surfaces of the reticle, respectively, while the cleaning device cleans the reticle;
• angles between the gas spraying directions of the gas sprayers and the reticle are the same and are between 15° and 25°;
• gas vents are formed on the side surface of the housing in the gas spraying directions;
• the gas flow sprayed by the gas sprayers is pulsed gas flow, the gas vents pump gas in the cleaning device by pulsed pumping, and the pulses of the gas flow are synchronized with or have a fixed time interval with the pulses of pulsed pumping;
• the cleaning device further comprises an electrical detection component and a gas adjustment component;
• the electrical detection component is configured to detect the electrical property of the attachments;
• and
• the gas adjustment component is configured to adjust the electrical property of gas sprayed by the gas sprayers to be opposite to the electrical property of the attachments.