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US 8,828,628 B2Granted
Method and system for design of a reticle to be manufactured using variable shaped beam lithography
AssigneeD2S, Inc.
InventorAkira Fujimura
Life of this patent
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Abstract
A method for optical proximity correction (OPC) is disclosed, in which a set of VSB shots is determined, where the set of shots can approximately form a target reticle pattern that is an OPC-compensated version of an input pattern. The set of shots is simulated to create a simulated reticle pattern. A substrate image is calculated, based on using the simulated reticle pattern in an optical lithographic process to form the substrate image. A system for OPC is also disclosed.
Claims21
A method for optical proximity correction (OPC) comprising:
- inputting an input pattern;
- determining a plurality of variable shaped beam (VSB) shots that can approximately form a target pattern on a reticle, wherein the target pattern is an OPC-compensated version of the input pattern;
- simulating a reticle pattern that will be produced on the reticle from the plurality of VSB shots;
- and
- calculating a substrate image which will be formed on a substrate using an optical lithographic process with the simulated reticle pattern, wherein the simulating and the calculating are performed on a computing hardware device.
2 more elements
A system for optical proximity correction (OPC) comprising:
- a device configured to:
- receive an input pattern;
- determine a plurality of variable shaped beam (VSB) shots that can approximately form a target pattern on a reticle, wherein the target pattern is an OPC-compensated version of the input pattern;
- simulate a reticle pattern that will be produced on the reticle from the plurality of VSB shots;
- and
- calculate a substrate image which will be formed on a substrate using an optical lithographic process with the simulated reticle pattern.
3 more elements
Dependencies are inferred from the claim text.