Cluster compound or salt thereof and photoresist composition including the same
AssigneesIndustry Foundation of Chonnam National University, Korea Research Institute of Chemical Technology
InventorsHyun-Dam JEONG, Hyeok YUN, Cheol-Min KIM, Kyuyoung HEO
Life of this patent
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Abstract
Provided are a cluster compound or a salt thereof, and a photoresist composition including the same. Since the cluster compound according to an example embodiment increases the density of a thin film by a hydrogen bond between clusters to suppress diffusion of produced secondary electrons and has a ring structure to have excellent etching resistance and mechanical strength, the compound may form a photoresist pattern having significantly improved EUV sensitivity.
Claims16
A cluster compound represented by any one of the following Chemical Formulae 1 to 3 or a salt thereof:
- wherein
- X is a halogen,
- A1 is a ligand selected from the group consisting of conjugate bases of formic acid, C1-C10 carboxylic acid, phosphoric acid, sulfuric acid, nitric acid, C1-C10 sulfonic acid, C1-C10 halosulfonic acid, C1-C10 phosphinic acid, C1-C10 halophosphinic acid, C1-C10 phosphonic acid, and C1-C10 halophosphonic acid, and
- L1 is a neutral or ionic ligand.
A method for preparing a cluster compound or a salt thereof, the method comprising:
- 1) preparing a solution including a tin halogen compound, water, and a neutral or ionic ligand;
- and
- 2) dissolving the solution in a solvent to prepare a cluster compound represented by any one of the following Chemical Formulae 1 to 3 or a salt thereof:
- wherein
- X is a halogen,
- A1 is a ligand selected from the group consisting of conjugate bases of formic acid, C1-C10 carboxylic acid, phosphoric acid, sulfuric acid, nitric acid, C1-C10 sulfonic acid, C1-C10 halosulfonic acid, C1-C10 phosphinic acid, C1-C10 halophosphinic acid, C1-C10 phosphonic acid, and C1-C10 halophosphonic acid, and
- L1 is a neutral or ionic ligand.
Dependencies are inferred from the claim text.