G03F 7/2061
Electron scattering correction or prevention methods
Official title: {Electron scattering (proximity) correction or prevention methods}
G03F7/2061 (Electron scattering correction or prevention methods) appears on 64 US grants and 64 published applications in this corpus.
Search patents in G03F- Granted patents
- 64
- Published applications
- 64
- Assignees
- 27
- Inventors
- 87
- Latest grant
- 21 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 0 |
| 2002 | 2 | 1 |
| 2003 | 0 | 1 |
| 2004 | 1 | 1 |
| 2005 | 0 | 1 |
| 2006 | 0 | 1 |
| 2007 | 2 | 0 |
| 2008 | 0 | 3 |
| 2009 | 0 | 0 |
| 2010 | 2 | 0 |
| 2011 | 2 | 2 |
| 2012 | 2 | 5 |
| 2013 | 4 | 8 |
| 2014 | 4 | 2 |
| 2015 | 4 | 4 |
| 2016 | 4 | 3 |
| 2017 | 3 | 1 |
| 2018 | 2 | 3 |
| 2019 | 2 | 4 |
| 2020 | 3 | 4 |
| 2021 | 6 | 3 |
| 2022 | 2 | 6 |
| 2023 | 3 | 6 |
| 2024 | 3 | 4 |
| 2025 | 5 | 1 |
| 2026 | 3 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method and system for determining a charged particle beam exposure for a local pattern density21 Jul 2026US 12,688,998 B2D2S, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus16 Jun 2026US 12,658,405 B2NuFlare Technology, Inc.
- Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method27 Jan 2026US 12,537,163 B2NuFlare Technology, Inc.
- Multi-charged particle beam writing apparatus and multi-charged particle beam writing method9 Sep 2025US 12,412,730 B2NuFlare Technology, Inc.
- Method of manufacturing integrated circuit8 Apr 2025US 12,271,107 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method of manufacturing integrated circuit19 Jun 2025US 2025/0199394 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method of manufacturing integrated circuit20 Jun 2024US 2024/0201579 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Electron beam lithography apparatus, electron beam lithography method, and recording medium2 May 2024US 2024/0145212 A1IMS Nanofabrication GmbH
- Electron beam writing apparatus and electron beam writing method14 Mar 2024US 2024/0087845 A1NuFlare Technology, Inc.
- Electron beam lithography with dynamic fin overlay correction22 Feb 2024US 2024/0061342 A1International Business Machines Corporation
Most cited
By later US patents
- Photo mask and method for manufacturing same42US 5,725,973 ASamsung Electronic Co., Ltd. · 1998
- Lithographic mask and method for fabrication thereof39US 6,017,658 AThe United States of America as represented by the Secretary of the Navy · 2000
- Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography28US 8,039,176 B2D2S, Inc. · 2011
- Method for fracturing and forming a pattern using shaped beam charged particle beam lithography23US 8,501,374 B2D2S, Inc. · 2013
- Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages19US 8,221,939 B2D2S, Inc. · 2012