Electron beam writing apparatus and electron beam writing method

An electron beam writing apparatus comprising:

• an emission source configured to emit an electron beam;
• a stage configured to mount thereon a target object on which a pattern is to be written with the electron beam;
• a potential regulating member arranged to be upstream of the target object in a case where the target object is placed on the stage and in a state where no electrode to which a variable potential is applied during writing is arranged between the target object and the potential regulating member, and configured to be set to have a fixed potential being positive with respect to the target object;
• a potential applying circuit configured to apply a voltage to one of the target object and the potential regulating member so that the potential regulating member has the fixed potential;
• and
• a correction circuit configured to correct a positional deviation of the electron beam on a surface of the target object which occurs in a case where the target object is irradiated with the electron beam in a state in which the potential regulating member has the fixed potential.