Method and system for determining a charged particle beam exposure for a local pattern density

A method for exposing a desired shape in an area on a surface using a charged particle beam system, the method comprising:

• determining a local pattern density for the area, based on an original set of exposure information;
• determining a pre-proximity effect correction (PEC) maximum dose for the local pattern density, based on a pre-determined target post-PEC maximum dose, wherein the pre-PEC maximum dose is calculated near an edge of the desired shape;
• and
• modifying the original set of exposure information with the pre-PEC maximum dose to create a modified set of exposure information;
• wherein the pre-determined target post-PEC maximum dose is based on a maximum write time.