Resist underlayer film-forming composition containing polycyclic aromatic-containing polymer
AssigneeNissan Chemical Corporation
InventorsRyuta MIZUOCHI, Hiroto OGATA, Mamoru TAMURA
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Abstract
A resist underlayer film which is a baked product of a coating film of a resist underlayer film-forming composition, the resist underlayer film-forming composition containing a polymer having at least one unit structure of a unit structure (A) having a polycyclic aromatic hydrocarbon structure and a unit structure (B) derived from a maleimide structure, and the resist underlayer film having a film thickness of less than 10 nm.
Claims21
A resist underlayer film which is a baked product of a coating film of a resist underlayer film-forming composition,
- the resist underlayer film-forming composition containing a polymer having at least one unit structure of a unit structure (A) having a polycyclic aromatic hydrocarbon structure, and a unit structure (B) derived from a maleimide structure, and
- the resist underlayer film having a film thickness of less than 10 nm.
A resist underlayer film-forming composition for EB or EUV lithography, comprising a polymer having at least one unit structure of a unit structure (A) having a polycyclic aromatic hydrocarbon structure and a unit structure (B) having a maleimide structure.
(canceled)
Dependencies are inferred from the claim text.