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US 2026/0299433 A1Published application
Digital lithography exposure unit boundary smoothing
AssigneeApplied Materials, Inc.
InventorChi-Ming Tsai
Life of this patent
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Abstract
A system includes a memory and at least one processing device, operatively coupled to the memory, to perform operations including initiating a digital lithography process to use a digital lithography system to pattern a substrate, controlling an area ratio in a first direction with respect to a first pair of adjacent exposure units of the digital lithography system, and controlling a dose ratio in a second direction perpendicular to the first direction with respect to a second pair of adjacent exposure units of the digital lithography system.
Claims20
A system comprising:
- a memory;
- and
- at least one processing device, operatively coupled to the memory, to perform operations comprising:
- initiating a digital lithography process to use a digital lithography system to pattern a substrate;
- controlling an area ratio in a first direction with respect to a first pair of adjacent exposure units of the digital lithography system;
- and
- controlling a dose ratio in a second direction perpendicular to the first direction with respect to a second pair of adjacent exposure units of the digital lithography system.
4 more elements
A method comprising:
- initiating, by at least one processing device, a digital lithography process to use a digital lithography system to pattern a substrate;
- controlling, by the at least one processing device, an area ratio in a first direction with respect to a first pair of adjacent exposure units of the digital lithography system;
- and
- controlling, by the at least one processing device, a dose ratio in a second direction perpendicular to the first direction with respect to a second pair of adjacent exposure units of the digital lithography system.
1 more element
A system comprising:
- a stage associated with a plurality of scan regions;
- a plurality of exposure units located above the stage, wherein the plurality of exposure units comprises a first pair of adjacent exposure units and a second pair of adjacent exposure units;
- at least one processing device, operatively coupled to a memory, to perform operations comprising:
- initiating a digital lithography process to pattern a substrate disposed on the stage;
- controlling an area ratio in a first direction with respect to the first pair of adjacent exposure units;
- and
- controlling a dose ratio in a second direction perpendicular to the first direction with respect to the second pair of adjacent exposure units.
4 more elements
Dependencies are inferred from the claim text.