G03F 7/2035
Simultaneous coating and exposure
Official title: {simultaneous coating and exposure; using a belt mask, e.g. endless}
G03F7/2035 (Simultaneous coating and exposure) appears on 50 US grants and 50 published applications in this corpus.
Search patents in G03F- Granted patents
- 50
- Published applications
- 50
- Assignees
- 45
- Inventors
- 119
- Latest grant
- 9 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 3 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 2 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 1 |
| 2003 | 0 | 2 |
| 2004 | 1 | 1 |
| 2005 | 1 | 3 |
| 2006 | 1 | 0 |
| 2007 | 2 | 2 |
| 2008 | 0 | 0 |
| 2009 | 0 | 3 |
| 2010 | 1 | 6 |
| 2011 | 2 | 3 |
| 2012 | 3 | 3 |
| 2013 | 5 | 4 |
| 2014 | 0 | 3 |
| 2015 | 3 | 3 |
| 2016 | 4 | 2 |
| 2017 | 1 | 5 |
| 2018 | 4 | 2 |
| 2019 | 2 | 1 |
| 2020 | 2 | 0 |
| 2021 | 1 | 1 |
| 2022 | 0 | 2 |
| 2023 | 0 | 0 |
| 2024 | 3 | 2 |
| 2025 | 0 | 1 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Exposure apparatus9 Jun 2026US 12,650,651 B2Contemporary Amperex Technology (Hong Kong) Limited
- Etching and thinning for the fabrication of lithographically patterned diamond nanostructures31 Dec 2024US 12,184,259 B2University of Oregon
- Systems and methods for combined radiation and functional layer application2 Jul 2024US 12,023,706 B2Esko-Graphics Imaging GmbH
- Method and apparatus for post exposure processing of photoresist wafers13 Feb 2024US 11,899,366 B2APPLIED Materials.Inc.
- Method and apparatus for post exposure processing of photoresist wafers7 Sep 2021US 11,112,697 B2APPLIED Materials.Inc.
- Continuous photolithographic fabrication process for producing seamless microstructures used in electro-optic displays and light modulating films8 May 2025US 2025/0147374 A1E Ink Corporation
- Substrate treatment apparatus15 Aug 2024US 2024/0272562 A1Contemporary Amperex Technology Co., Limited
- Exposure apparatus8 Aug 2024US 2024/0264541 A1Contemporary Amperex Technology Co., Limited
- Systems and methods for combined radiation and functional layer application16 Jun 2022US 2022/0184652 A1Esko-Graphics Imaging GmbH
- Method and apparatus for post exposure processing of photoresist wafers6 Jan 2022US 2022/0004104 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Microstructure synthesis by flow lithography and polymerization115US 7,709,544 B2Massachusetts Institute of Technology · 2010
- Stop flow interference lithography system60US 8,252,517 B2Massachusetts Institute of Technology · 2012
- Very large area patterning system for flexible substrates59US 6,018,383 AAnvik Corporation · 2000
- Process for forming both fixed and variable patterns on a single photoresist resin mask44US 5,733,711 AMicron Technology, Inc. · 1998
- Fabrication of nanostructured devices44US 8,318,386 B2Rolith, Inc. · 2012