G03F 7/2002
With visible light or uv light, through an original having an opaque
Official title: {with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image}
G03F7/2002 (With visible light or uv light, through an original having an opaque) appears on 2,810 US grants and 3,382 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,810
- Published applications
- 3,382
- Assignees
- 836
- Inventors
- 5,803
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 6 | 0 |
| 1978 | 1 | 0 |
| 1979 | 14 | 0 |
| 1980 | 6 | 0 |
| 1981 | 13 | 0 |
| 1982 | 3 | 0 |
| 1983 | 6 | 0 |
| 1984 | 12 | 0 |
| 1985 | 12 | 0 |
| 1986 | 12 | 0 |
| 1987 | 18 | 0 |
| 1988 | 10 | 0 |
| 1989 | 15 | 0 |
| 1990 | 15 | 0 |
| 1991 | 10 | 0 |
| 1992 | 23 | 0 |
| 1993 | 20 | 0 |
| 1994 | 30 | 0 |
| 1995 | 18 | 0 |
| 1996 | 15 | 0 |
| 1997 | 24 | 0 |
| 1998 | 27 | 0 |
| 1999 | 43 | 0 |
| 2000 | 26 | 0 |
| 2001 | 38 | 18 |
| 2002 | 38 | 45 |
| 2003 | 34 | 47 |
| 2004 | 37 | 43 |
| 2005 | 25 | 49 |
| 2006 | 37 | 51 |
| 2007 | 24 | 42 |
| 2008 | 24 | 34 |
| 2009 | 19 | 45 |
| 2010 | 34 | 40 |
| 2011 | 26 | 41 |
| 2012 | 37 | 52 |
| 2013 | 36 | 68 |
| 2014 | 53 | 91 |
| 2015 | 86 | 133 |
| 2016 | 117 | 145 |
| 2017 | 129 | 298 |
| 2018 | 165 | 271 |
| 2019 | 238 | 308 |
| 2020 | 225 | 289 |
| 2021 | 202 | 238 |
| 2022 | 200 | 251 |
| 2023 | 177 | 230 |
| 2024 | 168 | 212 |
| 2025 | 157 | 196 |
| 2026 | 99 | 145 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 7/2004Characterised by the use of a particular light source1,232
- G03F 7/2014Contact or film exposure of light sensitive plates such as lithographic plates645
- G03F 7/201Characterised by an oblique exposure225
- G03F 7/2008Characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective162
- G03F 7/2012Using liquid photohardening compositions121
Recent patents
- Apparatus for treating substrate and method for treating a substrate6 Oct 2026US 12,754,475 B2Semes Co., Ltd.
- EUV resist underlayer film-forming composition6 Oct 2026US 12,754,479 B2Nissan Chemical Corporation
- UV lithography system and method6 Oct 2026US 12,754,480 B2The Regents of the University of California
- Hardmask composition, hardmask layer, and pattern forming method6 Oct 2026US 12,754,481 B2Samsung SDI.Co., Ltd.
- Digital exposure system29 Sep 2026US 12,748,351 B2Korea Institute of Machinery & Materials
- Lithography focus control method8 Oct 2026US 2026/0310070 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process8 Oct 2026US 2026/0310075 A1Shin-Etsu Chemical Co., Ltd.
- Resist underlayer film-forming composition8 Oct 2026US 2026/0310081 A1Nissan Chemical Corporation
- Photolithography method and photolithography system8 Oct 2026US 2026/0310084 A1Shanghai Optoelectronics Science and Technology Innovation Center
- High chi block copolymer (bcp) pattern on latent extreme ultraviolet (euv) images8 Oct 2026US 2026/0310085 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Apparatus and method for photoetching of polyimides, polycarbonates and polyetherimides552US 4,857,382 AGeneral Electric Company · 1989
- Semiconductor substrate process using an optically writable carbon-containing mask539US 7,429,532 B2APPLIED Materials.Inc. · 2008
- Deep ultraviolet (DUV) flood exposure system479US 4,575,636 ARCA Corporation · 1986
- Organometallic solution based high resolution patterning compositions475US 9,310,684 B2Inpria Corporation · 2016
- Lithography patterning with a gas phase resist422US 10,018,920 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018