G03F 7/2004
Characterised by the use of a particular light source
Official title: {characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light}
G03F7/2004 (Characterised by the use of a particular light source) appears on 1,232 US grants and 1,792 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,232
- Published applications
- 1,792
- Assignees
- 337
- Inventors
- 2,684
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 2 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 3 | 0 |
| 1987 | 2 | 0 |
| 1988 | 3 | 0 |
| 1989 | 6 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 1 | 0 |
| 1993 | 3 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 3 | 0 |
| 1998 | 2 | 0 |
| 1999 | 7 | 0 |
| 2000 | 4 | 0 |
| 2001 | 5 | 2 |
| 2002 | 7 | 11 |
| 2003 | 6 | 7 |
| 2004 | 5 | 3 |
| 2005 | 1 | 6 |
| 2006 | 3 | 8 |
| 2007 | 3 | 5 |
| 2008 | 4 | 5 |
| 2009 | 2 | 6 |
| 2010 | 5 | 4 |
| 2011 | 5 | 3 |
| 2012 | 0 | 4 |
| 2013 | 4 | 6 |
| 2014 | 9 | 29 |
| 2015 | 18 | 30 |
| 2016 | 28 | 61 |
| 2017 | 58 | 200 |
| 2018 | 99 | 151 |
| 2019 | 138 | 183 |
| 2020 | 127 | 185 |
| 2021 | 114 | 160 |
| 2022 | 134 | 174 |
| 2023 | 118 | 154 |
| 2024 | 112 | 159 |
| 2025 | 109 | 129 |
| 2026 | 73 | 107 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- EUV resist underlayer film-forming composition6 Oct 2026US 12,754,479 B2Nissan Chemical Corporation
- UV lithography system and method6 Oct 2026US 12,754,480 B2The Regents of the University of California
- Compound, (co)polymer, composition, method for forming pattern, and method for producing compound15 Sep 2026US 12,735,382 B2Mitsubishi Gas Chemical Company, Inc.
- Apparatus and process for EUV dry resist sensitization by gas phase infusion of a sensitizer15 Sep 2026US 12,736,874 B2Lam Research Corporation
- Assembly for a laser-operated light source and method of use15 Sep 2026US 12,736,884 B2ASML Netherlands B. V.
- Lithography focus control method8 Oct 2026US 2026/0310070 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process8 Oct 2026US 2026/0310075 A1Shin-Etsu Chemical Co., Ltd.
- Resist underlayer film-forming composition8 Oct 2026US 2026/0310081 A1Nissan Chemical Corporation
- Magnetic annealing of metal oxide based resists8 Oct 2026US 2026/0310086 A1APPLIED Materials.Inc.
- Laser irradiation apparatus, laser processing apparatus, exposure apparatus, method for laser processing, method for exposure processing, method for installing mask, method for installing laser processing apparatus, method for installing exposure apparatus, and mask1 Oct 2026US 2026/0295721 A1Shin-Etsu Engineering Co., Ltd.
Most cited
By later US patents
- Apparatus and method for photoetching of polyimides, polycarbonates and polyetherimides552US 4,857,382 AGeneral Electric Company · 1989
- Deep ultraviolet (DUV) flood exposure system479US 4,575,636 ARCA Corporation · 1986
- Lithography patterning with a gas phase resist422US 10,018,920 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- EUV photopatterning of vapor-deposited metal oxide-containing hardmasks405US 9,996,004 B2Lam Research Corporation · 2018
- Assist layers for EUV lithography302US 8,968,989 B2Brewer Science Inc. · 2015