G03F 7/2006
Using coherent light
Official title: {using coherent light; using polarised light}
G03F7/2006 (Using coherent light) appears on 339 US grants and 452 published applications in this corpus.
Search patents in G03F- Granted patents
- 339
- Published applications
- 452
- Assignees
- 122
- Inventors
- 771
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 3 | 0 |
| 1989 | 4 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 5 | 0 |
| 2000 | 3 | 0 |
| 2001 | 3 | 1 |
| 2002 | 1 | 3 |
| 2003 | 4 | 2 |
| 2004 | 1 | 2 |
| 2005 | 0 | 1 |
| 2006 | 1 | 4 |
| 2007 | 1 | 1 |
| 2008 | 1 | 1 |
| 2009 | 2 | 4 |
| 2010 | 1 | 0 |
| 2011 | 2 | 1 |
| 2012 | 0 | 3 |
| 2013 | 2 | 0 |
| 2014 | 5 | 10 |
| 2015 | 4 | 4 |
| 2016 | 5 | 6 |
| 2017 | 12 | 61 |
| 2018 | 27 | 57 |
| 2019 | 32 | 53 |
| 2020 | 45 | 50 |
| 2021 | 32 | 29 |
| 2022 | 36 | 54 |
| 2023 | 21 | 35 |
| 2024 | 29 | 29 |
| 2025 | 27 | 28 |
| 2026 | 16 | 13 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Semiconductor photoresist composition and method of forming patterns using the composition25 Aug 2026US 12,717,228 B2Samsung SDI.Co., Ltd.
- Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board25 Aug 2026US 12,717,233 B2Resonac Corporation
- Method of operating semiconductor apparatus25 Aug 2026US 12,717,242 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Photosensitive polymer and resist composition having the same28 Jul 2026US 12,692,335 B2Chempole Co., Ltd.
- Bottom antireflective coating materials7 Jul 2026US 12,675,046 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Resist underlayer film-forming composition8 Oct 2026US 2026/0310081 A1Nissan Chemical Corporation
- Laser irradiation apparatus, laser processing apparatus, exposure apparatus, method for laser processing, method for exposure processing, method for installing mask, method for installing laser processing apparatus, method for installing exposure apparatus, and mask1 Oct 2026US 2026/0295721 A1Shin-Etsu Engineering Co., Ltd.
- Photoresist1 Oct 2026US 2026/0299408 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Poly(phthalaldehyde) derivatives, compositions including the same, and pattern formation methods3 Sep 2026US 2026/0259496 A1Cornell University
- Estimation method, control method and control device6 Aug 2026US 2026/0227707 A1SCREEN Holdings Co., Ltd.
Most cited
By later US patents
- Laser processing method of semiconductor device using a catalyst221US 5,756,364 ASemiconductor Energy Laboratory Co.Ltd. · 1998
- Excimer laser patterning of a novel resist114US 4,780,177 AGeneral Electric Company · 1988
- Optical transmission system and light radiating method112US 5,684,642 AMitsubishi Denki Kabushiki Kaisha · 1997
- Method of forming diffraction gratings and optical branching filter elements produced thereby86US 4,560,249 ASumitomo Electric Industries, Ltd. · 1985
- Holographic patterning method and tool for production environments69US 6,088,505 AHolographic Lithography Systems, Inc. · 2000