Semiconductor photoresist composition and method of forming patterns using the composition

A photoresist composition, comprising

• a first organometallic compound comprising a metal selected from Sn, Sb, In, Bi, Zr, and Hf;
• a second organometallic compound represented by Chemical Formula 1;
• and
• a solvent:
• wherein, in Chemical Formula 1,
• M1 is a metal selected from Sn, Sb, and Te, and
• R1 to R12 are each independently hydrogen, a halogen, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, or a combination thereof.