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US 12,692,335 B2Granted
Photosensitive polymer and resist composition having the same
AssigneesOlas Co., Ltd., Chempole Co., Ltd.
InventorsSang Jun Choi, Youngsun Kim, Jaebuem Oh
Life of this patent
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Abstract
Disclosed are a photosensitive polymer including a repeating unit of Chemical Formula 1 or Chemical Formula 2 derived from a vinyl heteroaromatic compound and a resist composition including the same. In Chemical Formula 1 or 2, R1 and R2 are hydrogen or a methyl group, X is a carbon, sulfur, or a nitrogen atom, and n is 1 or 2.
Claims8
A photosensitive polymer, comprising
- a repeating unit (1) of a vinyl heteroaromatic compound, wherein the vinyl heteroaromatic compound is any one selected from the following compounds:
- wherein R1 is hydrogen or a methyl group,
- a repeating unit (2) of the following Chemical formula:
- wherein, R3 is hydrogen or a methyl group, and R4 is a tertiary alkyl group,
- a repeating unit (3) of the following Chemical formula:
- wherein, R3 is hydrogen or a methyl group, and R4 is a lactone derivative, and
- a repeating unit (4) of the following Chemical formula:
- wherein, R5 is hydrogen or a methyl group,
- R6 is a cycloalkyl group including a polar group selected from a hydroxyl group, a carboxyl group, and a combination thereof.
6 more elements
Dependencies are inferred from the claim text.